Thermal stability of cobalt silicide thin films on Si(100)

1993 ◽  
Vol 74 (2) ◽  
pp. 1035-1039 ◽  
Author(s):  
Bin‐Shing Chen ◽  
Mao‐Chieh Chen
2021 ◽  
Vol 46 (5) ◽  
pp. 4137-4153
Author(s):  
Neha Verma ◽  
Rob Delhez ◽  
Niek M. van der Pers ◽  
Frans D. Tichelaar ◽  
Amarante J. Böttger

1998 ◽  
Vol 16 (2) ◽  
pp. 477-481 ◽  
Author(s):  
Yong Tae Kim ◽  
Chul Soon Kwon ◽  
Dong Joon Kim ◽  
Jong-Wan Park ◽  
Chang Woo Lee

2005 ◽  
Vol 891 ◽  
Author(s):  
Kil Jin Han ◽  
Yu Jung Cho ◽  
Soon Young Oh ◽  
Yong Jin Kim ◽  
Won Jae Lee ◽  
...  

ABSTRACTIn this study, we have investigated the structure of nickel-cobalt silicide to understand its behavior at high temperature. Nickel-cobalt silicide was formed after two-step RTP at 500°C and 700°C respectively. We could observe by TEM that nickel-cobalt silicide consists of a structure which seems to be a Ni-Co-Si ternary phase. No nickel silicide phases and cobalt silicide phases were detected in nickel-cobalt silicide by XRD. From XPS depth profile, we could confirm that there is a cobalt composition gradient along the silicide.


1999 ◽  
Vol 86 (11) ◽  
pp. 6276-6281 ◽  
Author(s):  
J. V. Anguita ◽  
S. R. P. Silva ◽  
A. P. Burden ◽  
B. J. Sealy ◽  
S. Haq ◽  
...  

Metals ◽  
2018 ◽  
Vol 8 (7) ◽  
pp. 514 ◽  
Author(s):  
Yung-I Chen ◽  
Zhi-Ting Zheng ◽  
Jia-Wei Jhang

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