Preparation and properties of Bi4Ti3O12 single‐crystal thin films by atmospheric pressure metalorganic chemical vapor deposition

H. Wang; L. W. Fu; S. X. Shang

doi:10.1063/1.353929

Preparation and properties of Bi4Ti3O12 single‐crystal thin films by atmospheric pressure metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.353929 ◽

1993 ◽

Vol 73 (11) ◽

pp. 7963-7965 ◽

Cited By ~ 26

Author(s):

H. Wang ◽

L. W. Fu ◽

S. X. Shang

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Growth and optical properties of Bi2Ti2O7 single-crystal thin films on Si(100) by atmospheric pressure metalorganic chemical vapor deposition

10.1117/12.252974 ◽

1996 ◽

Cited By ~ 1

Author(s):

Hong Wang ◽

Z. H. Wang ◽

M. Wang ◽

S. X. Shang

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Preparation and ferroelectric properties of BaTiO3 thin films by atmospheric-pressure metalorganic chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(97)00965-6 ◽

1998 ◽

Vol 322 (1-2) ◽

pp. 104-107 ◽

Cited By ~ 24

Author(s):

Jianming Zeng ◽

Hong Wang ◽

Ming Wang ◽

Suxia Shang ◽

Zuo Wang ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Ferroelectric Properties ◽

Chemical Vapor ◽

Metalorganic Chemical

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Metalorganic chemical vapor deposition technique for growingc‐axis oriented ZnO thin films in atmospheric pressure air

Applied Physics Letters ◽

10.1063/1.112056 ◽

1994 ◽

Vol 65 (11) ◽

pp. 1373-1375 ◽

Cited By ~ 27

Author(s):

N. Deepak Kumar ◽

M. N. Kamalasanan ◽

Subhas Chandra

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Zno Thin Films ◽

Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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Preparation and characterization of MgTiO3 thin films by atmospheric pressure metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(96)01177-3 ◽

1997 ◽

Vol 178 (3) ◽

pp. 355-359 ◽

Cited By ~ 20

Author(s):

Jianming Zeng ◽

Hong Wang ◽

Shigeng Song ◽

Qun Zhang ◽

Jiangong Cheng ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Effect of Substrates and Thermal Treatments on Metalorganic Chemical Vapor Deposition-Grown Sb2Te3 Thin Films

Crystal Growth & Design ◽

10.1021/acs.cgd.1c00508 ◽

2021 ◽

Author(s):

Martino Rimoldi ◽

Raimondo Cecchini ◽

Claudia Wiemer ◽

Emanuele Longo ◽

Stefano Cecchi ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Thermal Treatments ◽

Metalorganic Chemical

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Cited By ~ 34

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Epitaxial thin films of YBa2Cu3O7−xon LaAlO3substrates deposited by plasma‐enhanced metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.104973 ◽

1991 ◽

Vol 58 (2) ◽

pp. 185-187 ◽

Cited By ~ 36

Author(s):

C. S. Chern ◽

J. Zhao ◽

Y. Q. Li ◽

P. Norris ◽

B. Kear ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Epitaxial Thin Films ◽

Metalorganic Chemical

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Mechanistic study of metalorganic chemical vapor deposition of (Ba,Sr)TiO3 thin films

Journal of Applied Physics ◽

10.1063/1.373005 ◽

2000 ◽

Vol 87 (10) ◽

pp. 7430-7437 ◽

Cited By ~ 13

Author(s):

Y. Gao ◽

C. L. Perkins ◽

S. He ◽

P. Alluri ◽

T. Tran ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Mechanistic Study ◽

Metalorganic Chemical

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Microstructure and Optical Properties of Al[sub x]Ga[sub 1−x]N∕GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method

10.1063/1.2906048 ◽

2008 ◽

Author(s):

H. Sutanto ◽

A. Subagio ◽

E. Supriyanto ◽

P. Arifin ◽

M. Budiman ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Gan Heterostructure ◽

Metalorganic Chemical

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