Low energy carbon ion bombardment on indium phosphide and its implications for alkane‐based reactive ion etching

1992 ◽  
Vol 71 (11) ◽  
pp. 5623-5628 ◽  
Author(s):  
P. F. A. Meharg ◽  
E. A. Ogryzlo ◽  
I. Bello ◽  
W. M. Lau
Keyword(s):  
Indium Phosphide ◽  
Reactive Ion Etching ◽  
Ion Bombardment ◽  
Low Energy ◽  
Ion Etching ◽  
Carbon Ion

In-situAfter-treatment Using Low-energy Dry-etching with a CF4/O2Gas Mixture to Remove Reactive Ion Etching Damage

1998 ◽  
Vol 37 (Part 1, No. 4B) ◽  
pp. 2330-2336 ◽  
Author(s):  
Miyako Matsui ◽  
Fumihiko Uchida ◽  
Masayuki Kojima ◽  
Takafumi Tokunaga ◽  
Kazuo Yamazaki ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Dry Etching ◽  
Low Energy ◽  
Ion Etching

Modification of surface band bending of diamond by low energy argon and carbon ion bombardment

1994 ◽  
Vol 75 (7) ◽  
pp. 3385-3391 ◽  
Author(s):  
W. M. Lau ◽  
L. J. Huang ◽  
I. Bello ◽  
Y. M. Yiu ◽  
S.‐T. Lee
Keyword(s):  
Ion Bombardment ◽  
Low Energy ◽  
Surface Band ◽  
Band Bending ◽  
Carbon Ion

Low-Damage Indium Phosphide Sidewall Formation by Reactive Ion Etching

2002 ◽  
Vol 41 (Part 1, No. 2B) ◽  
pp. 1072-1075 ◽  
Author(s):  
Nobuhiro Saga ◽  
Takeyoshi Masuda ◽  
Takeshi Kishi ◽  
Michio Murata ◽  
Akira Yamaguchi ◽  
...  
Keyword(s):  
Indium Phosphide ◽  
Reactive Ion Etching ◽  
Ion Etching

Low‐energy high flux reactive ion etching by rf magnetron plasma

1984 ◽  
Vol 44 (2) ◽  
pp. 185-187 ◽  
Author(s):  
Lin I ◽  
D. C. Hinson ◽  
W. H. Class ◽  
R. L. Sandstrom
Keyword(s):  
Reactive Ion Etching ◽  
Low Energy ◽  
High Flux ◽  
Ion Etching

Magnetron Enhanced Reactive Ion Etching in a Hexode System

1986 ◽  
Vol 68 ◽  
Author(s):  
Scott Bell ◽  
Thijs Bril
Keyword(s):  
Magnetic Field ◽  
Uniform Magnetic Field ◽  
Reactive Ion Etching ◽  
Ion Bombardment ◽  
Ion Flux ◽  
Ion Etching ◽  
Resulting Effect ◽  
Bombardment Energy

AbstractA method of forming a uniform magnetic field in a modified hexode type etch system is described.Experimental results of etching Si, SiO2 and photoresist with NF3 are presented.The magnetic field effectively increases the ion flux and decreases the energy of the ions bombarding the cathode.It was found that adding a magnetic field increases the etchrate of Si for the conditions studied, but for SiO2 and photoresist, the decreased ion bombardment energy leads to lower etchrates under certain conditions.The resulting effect on selectivities is discussed.

Oxidation and ion Damage of Diamond by Reactive Ion Etching

1994 ◽  
Vol 339 ◽  
Author(s):  
T. E. Beerling ◽  
C. R. Helms
Keyword(s):  
Carbon Materials ◽  
Reactive Ion Etching ◽  
Ion Bombardment ◽  
Diamond Surface ◽  
Hydrogen Ions ◽  
Ion Etching ◽  
Diamond Surfaces ◽  
Oxygen Ion ◽  
Ion Damage ◽  
Electron Energy Loss

ABSTRACTOxygen is a commonly used etchant of carbon materials, including diamond. In this work, we examine the effects of oxygen ion bombardment to diamond surfaces, as might be encountered in a reactive ion etching (RIE) process. Surfaces were characterized using Electron Energy Loss Spectroscopy (EELS) and Auger Electron Spectroscopy (AES). EELS was used to determine the presence of non-diamond carbon at the surface which may form due to ion damage. AES was used to determine the presence of oxygen on the diamond surface from oxygen ion bombardment. The effect of ambient molecular oxygen present during inert ion bombardment is also addressed. EELS was also used to determine the state of diamond surfaces that were bombarded with hydrogen ions, as might be used in the removal of adsorbed oxygen.

Surface damage and deposition on gallium arsenide resulting from low energy carbon ion bombardment

1992 ◽  
Vol 271 (3) ◽  
pp. 468-476 ◽  
Author(s):  
P.F.A. Meharg ◽  
E.A. Ogryzlo ◽  
I. Bello ◽  
W.M. Lau
Keyword(s):  
Gallium Arsenide ◽  
Ion Bombardment ◽  
Surface Damage ◽  
Low Energy ◽  
Carbon Ion

Magnetron Reactive Ion Etching of GaAs and AIGaAs in CH4/H2/Ar Plasmas.

1996 ◽  
Author(s):  
George F. McLane ◽  
Paul Cooke ◽  
Robert P. Moerkirk
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching
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