Profile of titanium lines produced by excimer laser direct writing on lithium niobate

1991 ◽  
Vol 70 (4) ◽  
pp. 2343-2347 ◽  
Author(s):  
C. Lavoie ◽  
M. Meunier ◽  
S. Boivin ◽  
R. Izquierdo ◽  
P. Desjardins
Keyword(s):  
Lithium Niobate ◽  
Excimer Laser ◽  
Direct Writing ◽  
Laser Direct Writing

Excimer laser direct writing of titanium lines on lithium niobate

1990 ◽  
Vol 57 (7) ◽  
pp. 647-649 ◽  
Author(s):  
R. Izquierdo ◽  
C. Lavoie ◽  
M. Meunier
Keyword(s):  
Lithium Niobate ◽  
Excimer Laser ◽  
Direct Writing ◽  
Laser Direct Writing

KrF Excimer Laser Direct Writing of Titanium Lines: Modeling and Application to the Fabrication of Ti:Linbo3 Waveguides

1990 ◽  
Vol 201 ◽  
Author(s):  
M. Meunier ◽  
C. Lavoie ◽  
S. Boivin ◽  
R. Izquierdo ◽  
P. Desjardins ◽  
...  
Keyword(s):  
Lithium Niobate ◽  
Low Power ◽  
Power Density ◽  
Excimer Laser ◽  
Line Profile ◽  
Optical Waveguides ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Preliminary Results ◽  
Krf Excimer Laser

AbstractThe deposition of titanium lines by KrF excimer laser direct writing on lithium niobate (LiNbO3) has been investigated. A detailled study of the line profile has been performed since this is critical in the fabrication of Ti:LiNbO3 optical waveguides. We show that at a low power density E, the maximum thickness t is proportional to E, while increasing E leads to the diffusion of Ti into LiNbO3 resulting in a saturation and even a decrease in thickness. Preliminary results on Ti:LiNbO3 optical waveguides show that their characteristics are similar to those made by conventional methods.

Patterning of ITO on Glass with Two-Step Using Excimer Laser and Wet Chemical Re-Etching

2011 ◽  
Vol 291-294 ◽  
pp. 1393-1398
Author(s):  
Xue Fei Shen ◽  
Tao Chen ◽  
Ning Liu
Keyword(s):  
Excimer Laser ◽  
Laser Fluence ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Etching Depth ◽  
Ito Electrode ◽  
Ridge Height ◽  
Edge Quality ◽  
Wet Chemical

ITO electrode patterns were fabricated using excimer laser direct-writing technique. The influence of the process parameters (the excimer laser fluence and the stage velocity) on the micromachining quality (the etching depth and ridge height of the edge ) of ITO patterns were experimentally studied. In this paper, the effect of laser fluence and the speed of working platform on the fabrication quality were discussed. The lower laser fluence and suitable platform speed will be very helpful to improve the edge quality of patterning of ITO. However, the recast ridge at the edge also was shown. Use of 39% solution of hydrochloric acid made it possible to further minimize the recast ridge at the edges.

Laser direct writing of photonic structures in X-cut lithium niobate using femtosecond pulses

2010 ◽  
Author(s):  
Venugopal Rao Soma ◽  
Shuvan Prashant Turaga ◽  
Deepak K. L. N. ◽  
Surya P. Tewari ◽  
Manoj Kumar Gundawar ◽  
...  
Keyword(s):  
Lithium Niobate ◽  
Femtosecond Pulses ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Photonic Structures

scholarly journals Low-Loss Lithium Niobate on Insulator (LNOI) Waveguides of a 10 cm-Length and a Sub-Nanometer Surface Roughness

2018 ◽  
Author(s):  
Rongbo Wu ◽  
Min Wang ◽  
Jian Xu ◽  
Jia Qi ◽  
Wei Chu ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Lithium Niobate ◽  
Integrated Circuits ◽  
Large Scale ◽  
Photonic Integrated Circuits ◽  
Propagation Loss ◽  
Direct Writing ◽  
Laser Direct Writing ◽  
Low Loss ◽  
Atomic Force

We develop a technique for realizing lithium niobate on insulator (LNOI) waveguides of a multi-centimeter-length with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium (Cr) thin film coated on the top surface of LNOI into a hard mask with a femtosecond laser followed by the chemo-mechanical polishing for structuring the LNOI into the waveguides. The surface roughness on the waveguides is determined to be 0.452 nm with an atomic force microscope (AFM). The approach is compatible with other surface patterning technologies such as optical and electron beam lithographies or laser direct writing, enabling high-throughput manufacturing of large-scale LNOI-based photonic integrated circuits.

Laser direct writing: Enabling monolithic and hybrid integrated solutions on the lithium niobate platform

2010 ◽  
Vol 208 (2) ◽  
pp. 276-283 ◽  
Author(s):  
Jens Thomas ◽  
Matthias Heinrich ◽  
Peter Zeil ◽  
Vinzenz Hilbert ◽  
Katja Rademaker ◽  
...  
Keyword(s):  
Lithium Niobate ◽  
Direct Writing ◽  
Laser Direct Writing
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