Intrinsic stress in hydrogenated amorphous carbon prepared by rf plasma decomposition of methane

1991 ◽  
Vol 70 (9) ◽  
pp. 4903-4908 ◽  
Author(s):  
E. T. Prince
Keyword(s):  
Amorphous Carbon ◽  
Intrinsic Stress ◽  
Rf Plasma ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Decomposition ◽  
Decomposition Of Methane ◽  
Hydrogenated Amorphous

Thermally stimulated exoelectron emission from hydrogenated amorphous carbon films

1992 ◽  
Vol 7 (7) ◽  
pp. 1805-1808
Author(s):  
Yoshihisa Watanabe ◽  
Yoshikazu Nakamura ◽  
Shigekazu Hirayama ◽  
Yoshimasa Yamaguchi
Keyword(s):  
Stainless Steel ◽  
Amorphous Carbon ◽  
Stainless Steel Substrate ◽  
Steel Substrate ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Rf Plasma ◽  
Exoelectron Emission ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

Hydrogenated amorphous carbon (a–C:H) films on stainless steel (AISI430) substrate oxidized in air at 1273 K were prepared from a gas mixture of methane and hydrogen by an rf plasma chemical vapor deposition, and thermally stimulated exoelectron emission (TSEE) was studied for the x-ray irradiated a–C:H films. Glow curves and energy distributions of TSEE from the 80- and 280-nm a–C:H films and from the AISI430 substrate have been measured under ultrahigh vacuum conditions. It was found that the glow curve from the 80-nm a–C:H film was similar to that from the AISI430 substrate, but it was quite different from that from the 280-nm film; the values of the mean energy of exoelectrons at the glow peak temperatures from the 80-nm a–C:H film are almost the same as those from the substrate but are much lower than those of the 280-nm film. The surfaces of 80- and 280-nm a–C:H films are observed with the scanning electron microscope (SEM). Observations by SEM show that the 80-nm film has relatively large-sized clusters of films and the stainless steel substrate still appears in some places, but the surface of the 280-nm film is completely covered by the carbon films. From these results, we propose that TSEE from the 80-nm film originates mainly from the oxide films on the stainless steel substrate and TSEE from the 280-nm film originates from the film itself. Thus, TSEE can be applied to characterize the surface of thin films.

Structural Studies of Hydrogenated Amorphous Carbon Infrared Coatings

1986 ◽  
Vol 90 ◽  
Author(s):  
C. J. Robinson ◽  
M. G. Samant ◽  
J. Stohr ◽  
V. S. Speriosu ◽  
C. R. Guarnieri ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Nearest Neighbor ◽  
Film Growth ◽  
Carbon Films ◽  
Nuclear Reaction Analysis ◽  
Hydrogenated Amorphous Carbon ◽  
Self Bias ◽  
Plasma Decomposition ◽  
Reactor Operating ◽  
Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous carbon thin films are well known for their mechanical hardness and optical properties which make them useful for applications in infrared device coatings. In this work films have been prepared by plasma. decomposition of methane using an RF diode reactor operating under conditions of high self bias potential (Vb = 1 KeV). The resulting ion bombardment during film growth leads to the formation of hard, insulating carbon coatings which have a band gap of ≃1.1 eV and are transparent in the IR. Nuclear reaction analysis has been used to quantify the atomic concentration of hydrogen incorporated in the films and extended x-ray absorption fine structure (EXAFS) has been used to determine local site geometry. Only first and second nearest neighbor bond lengths are observed with no evidence of further long range order or microcrystallinity. A model for atomic structure is proposed which includes both sp2 and sp3 bond configurations and direct comparisons are made with data obtained from sputtered carbon films, graphite and diamond.

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