Three‐dimensional transient mass transfer model for laser chemical vapor deposition of titanium on stationary finite slabs

1991 ◽  
Vol 69 (2) ◽  
pp. 757-766 ◽  
Author(s):  
A. Kar ◽  
M. N. Azer ◽  
J. Mazumder
Keyword(s):  
Mass Transfer ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Transfer Model ◽  
Mass Transfer Model ◽  
Laser Chemical Vapor Deposition

Experimental and Numerical Modeling Studies of Laser Chemical Vapor Deposition on Moving Optical Fibers

Volume 3 ◽  
2004 ◽  
Author(s):  
Kinghong Kwok ◽  
Wilson K. S. Chiu
Keyword(s):  
Chemical Vapor Deposition ◽  
Optical Fibers ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Fiber Surface ◽  
Chemical Vapor ◽  
Transfer Model ◽  
Laser Chemical Vapor Deposition ◽  
Protective Films ◽  
The Relationship

An atmospheric-pressure laser-induced chemical vapor deposition (CVD) reactor has been developed that is capable of continuously depositing carbon protective films on moving optical fibers from several hydrocarbon precursors. The relationship between operating parameters and the carbon deposition temperature was investigated experimentally and the results indicate that they are highly dependent on the laser power density and the fiber’s drawing velocity. A computational heat transfer model was developed to calculate the fiber surface temperature during deposition and to provide a deeper understanding of the fundamental principles that govern laser heating and the carbon CVD processes. The surface temperatures obtained from experiments are compared with the calculated temperature in order to validate the numerical model.

Generation of Process Plans for Laser Chemical Vapor Deposition

2003 ◽  
Author(s):  
Jae-hyoung Park ◽  
David W. Rosen
Keyword(s):  
Chemical Vapor Deposition ◽  
Process Planning ◽  
Vapor Deposition ◽  
Local Heating ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Layer By Layer ◽  
Laser Chemical Vapor Deposition ◽  
Thin Walls ◽  
Planning Methods

Rapid Prototyping (RP) technology refers to the fabrication of an arbitrary three-dimensional part layer-by-layer. Laser Chemical Vapor Deposition (LCVD) is a promising RP and manufacturing process that deposits metals and ceramics by local heating of a substrate with a laser. Even though many LCVD process planning characteristics are shared with those of more common RP technologies, LCVD process planning requires new efforts due to its unique characteristics. Unlike a conventional RP technology that only builds horizontal planar layers, LCVD can build conformal layers (conform to nonplanar substrates), thin walls, and fibers (rod-shape) as build primitives. Based on these unique characteristics, we have developed the overall approach for LCVD process planning and developed several of the main methods in this approach. In this paper, we report on the overall approach, the conformal slicing algorithm, and two different 1D path generation algorithms. Two examples are presented to illustrate the application of the process planning methods.

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