Real-time volumetric growth rate measurements and feedback control of three-dimensional laser chemical vapor deposition

1998 ◽  
Vol 67 (3) ◽  
pp. 323-329 ◽  
Author(s):  
J.L. Maxwell ◽  
J. Pegna ◽  
D.V. Messia
Keyword(s):  
Growth Rate ◽  
Chemical Vapor Deposition ◽  
Feedback Control ◽  
Real Time ◽  
Vapor Deposition ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Volumetric Growth

Generation of Process Plans for Laser Chemical Vapor Deposition

2003 ◽  
Author(s):  
Jae-hyoung Park ◽  
David W. Rosen
Keyword(s):  
Chemical Vapor Deposition ◽  
Process Planning ◽  
Vapor Deposition ◽  
Local Heating ◽  
Three Dimensional ◽  
Chemical Vapor ◽  
Layer By Layer ◽  
Laser Chemical Vapor Deposition ◽  
Thin Walls ◽  
Planning Methods

Rapid Prototyping (RP) technology refers to the fabrication of an arbitrary three-dimensional part layer-by-layer. Laser Chemical Vapor Deposition (LCVD) is a promising RP and manufacturing process that deposits metals and ceramics by local heating of a substrate with a laser. Even though many LCVD process planning characteristics are shared with those of more common RP technologies, LCVD process planning requires new efforts due to its unique characteristics. Unlike a conventional RP technology that only builds horizontal planar layers, LCVD can build conformal layers (conform to nonplanar substrates), thin walls, and fibers (rod-shape) as build primitives. Based on these unique characteristics, we have developed the overall approach for LCVD process planning and developed several of the main methods in this approach. In this paper, we report on the overall approach, the conformal slicing algorithm, and two different 1D path generation algorithms. Two examples are presented to illustrate the application of the process planning methods.

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