Nondestructive characterization of silicon‐on‐insulator structures using infrared spectroscopic ellipsometry

1990 ◽  
Vol 68 (11) ◽  
pp. 5810-5813 ◽  
Author(s):  
F. Ferrieu ◽  
D. Dutartre
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Silicon On Insulator ◽  
Infrared Spectroscopic ◽  
Nondestructive Characterization

scholarly journals Nondestructive characterization of nitrogen‐implanted silicon‐on‐insulator structures by spectroscopic ellipsometry

1989 ◽  
Vol 66 (10) ◽  
pp. 5052-5057 ◽  
Author(s):  
M. Fried ◽  
T. Lohner ◽  
J. M. M. de Nijs ◽  
A. van Silfhout ◽  
L. J. Hanekamp ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Silicon On Insulator ◽  
Nondestructive Characterization

Formation and nondestructive characterization of ion implanted silicon‐on‐insulator layers

1987 ◽  
Vol 51 (5) ◽  
pp. 343-345 ◽  
Author(s):  
J. Narayan ◽  
S. Y. Kim ◽  
K. Vedam ◽  
R. Manukonda
Keyword(s):  
Silicon On Insulator ◽  
Insulator Layers ◽  
Nondestructive Characterization ◽  
Ion Implanted

Combined characterization of conductive materials by infrared spectroscopic ellipsometry and grazing X-ray reflectance

1998 ◽  
Vol 319 (1-2) ◽  
pp. 67-72 ◽  
Author(s):  
Pierre Boher ◽  
Michel Luttmann ◽  
Jean Louis Stehle ◽  
Louis Hennet
Keyword(s):  
Spectroscopic Ellipsometry ◽  
X Ray ◽  
Conductive Materials ◽  
Infrared Spectroscopic

Characterization of the silicon‐on‐insulator material formed by high‐dose oxygen implantation using spectroscopic ellipsometry

1987 ◽  
Vol 62 (8) ◽  
pp. 3458-3461 ◽  
Author(s):  
F. Ferrieu ◽  
D. P. Vu ◽  
C. D’Anterroches ◽  
J. C. Oberlin ◽  
S. Maillet ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Silicon On Insulator ◽  
High Dose ◽  
Oxygen Implantation
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