Characterization of gate recessed GaN/AlGaN/GaN high electron mobility transistors fabricated using a SiCl4/SF6 dry etch recipe

2010 ◽  
Vol 108 (1) ◽  
pp. 013711 ◽  
Author(s):  
R. T. Green ◽  
I. J. Luxmoore ◽  
K. B. Lee ◽  
P. A. Houston ◽  
F. Ranalli ◽  
...  
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