Characteristics of GaAs/AlGaAs heterostructures grown by liquid‐phase epitaxy on molecular‐beam‐coated GaAs on Si

1988 ◽  
Vol 64 (6) ◽  
pp. 3201-3204 ◽  
Author(s):  
J. P. van der Ziel ◽  
R. A. Logan ◽  
N. Chand
Keyword(s):  
Liquid Phase ◽  
Liquid Phase Epitaxy ◽  
Molecular Beam ◽  
Gaas On Si

Ion milling-assisted study of defect structure of HgCdTe films grown by liquid phase epitaxy

2010 ◽  
Vol 18 (3) ◽  
Author(s):  
I.I. Izhnin ◽  
I.A. Denisov ◽  
N.A. Smirnova ◽  
M. Pociask ◽  
K.D. Mynbaev
Keyword(s):  
Liquid Phase ◽  
Thermal Treatment ◽  
Liquid Phase Epitaxy ◽  
Defect Structure ◽  
Molecular Beam ◽  
Donor Concentration ◽  
Ion Milling ◽  
High Concentration ◽  
Low Temperature Annealing ◽  
Cdznte Substrates

AbstractIon milling, as a tool for “stirring” defects in HgCdTe by injecting high concentration of interstitial mercury atoms, was used for studying films grown by liquid phase epitaxy (LPE) on CdZnTe substrates. The films appeared to have very low residual donor concentration (∼1014 cm−3), yet, similar to the material grown by molecular beam epitaxy, contained Te-related neutral defects, which the milling activated electrically. It is shown that ion milling has a stronger effect on HgCdTe defect structure than thermal treatment, and yet eventually brings the material to an “equilibrium” state with defect concentration lower than that after low-temperature annealing.

Aging characteristics of 1.65‐μm InGaAs/InP buried heterostructure lasers grown by molecular‐beam and liquid phase epitaxy

1984 ◽  
Vol 55 (3) ◽  
pp. 656-659 ◽  
Author(s):  
H. Asahi ◽  
M. Fukuda ◽  
Y. Kawamura ◽  
Y. Noguchi ◽  
H. Nagai ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Liquid Phase Epitaxy ◽  
Molecular Beam ◽  
Buried Heterostructure

Comparison of the current characteristics of photodiodes formed on CdHgTe films grown by molecular-beam and liquid-phase epitaxy for the 8-12-μm spectral range

2009 ◽  
Vol 76 (12) ◽  
pp. 767 ◽  
Author(s):  
E. V. Andreeva ◽  
Zh. V. Gumenyuk-Sychevskaya ◽  
Z. F. Tsibriĭ ◽  
F. F. Sizov ◽  
V. S. Varavin ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Spectral Range ◽  
Liquid Phase Epitaxy ◽  
Molecular Beam ◽  
Current Characteristics

scholarly journals Релаксационные потери магнитных возбуждений в наноразмерных пленках железо-иттриевого граната

2018 ◽  
Vol 44 (13) ◽  
pp. 10 ◽  
Author(s):  
Л.В. Луцев ◽  
С.М. Сутурин ◽  
А.М. Коровин ◽  
В.Э. Бурсиан ◽  
Н.С. Соколов
Keyword(s):  
Liquid Phase ◽  
Molecular Beam Epitaxy ◽  
Ferromagnetic Resonance ◽  
Liquid Phase Epitaxy ◽  
Molecular Beam ◽  
Thick Films ◽  
Relaxation Processes ◽  
Resonance Linewidth ◽  
Nanoscale Films ◽  
Ferromagnetic Resonance Linewidth

AbstractRelaxation losses of magnetic excitations in nanoscale films of Y_3Fe_5O_12 (YIG) were studied. The films were obtained by laser molecular-beam epitaxy (LMBE). Ferromagnetic resonance linewidth Δ H was found to increase sharply as the temperature decreased from 300 to 77 K. The observed growth of Δ H is explained by typical relaxation processes caused by the presence of Fe^2+ ions. This effect is not observed in thick films of YIG grown by liquid-phase epitaxy and containing Pb^4+ ions, and, hence, we have concluded that the presence of acceptor ions in YIG films obtained by LMBE will facilitate decreasing the concentration of Fe^2+ ions and, a result, diminishing relaxation losses.

Background donor concentration in HgCdTe

2015 ◽  
Vol 23 (3) ◽  
Author(s):  
I.I. Izhnin ◽  
K.D. Mynbaev ◽  
A.V. Voitsekhovsky ◽  
A.G. Korotaev ◽  
O.I. Fitsych ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Molecular Beam Epitaxy ◽  
Liquid Phase Epitaxy ◽  
Molecular Beam ◽  
Donor Concentration ◽  
Bulk Crystals ◽  
Ion Milling ◽  
Si Substrates ◽  
Different Types

AbstractStudies of background donor concentration (BDC) in HgCdTe samples grown with different types of technology were performed with the use of ion milling as a means of eliminating the compensating acceptors. In bulk crystals, films grown with liquid phase epitaxy and films fabricated with molecular beam epitaxy (MBE) on Si substrates, BDC of the order of ~10

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