In situ infrared reflection absorption spectroscopic characterization of plasma enhanced chemical vapor deposited SiO2 films

Kent B. Koller; William A. Schmidt; James E. Butler

doi:10.1063/1.341207

In situ infrared reflection absorption spectroscopic characterization of plasma enhanced chemical vapor deposited SiO2 films

Journal of Applied Physics ◽

10.1063/1.341207 ◽

1988 ◽

Vol 64 (9) ◽

pp. 4704-4710 ◽

Cited By ~ 45

Author(s):

Kent B. Koller ◽

William A. Schmidt ◽

James E. Butler

Keyword(s):

Chemical Vapor ◽

Spectroscopic Characterization ◽

Sio2 Films ◽

Infrared Reflection ◽

Chemical Vapor Deposited

Download Full-text

X-ray photoelectron spectroscopic characterization of the adhesion behavior of chemical vapor deposited copper films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1399323 ◽

2001 ◽

Vol 19 (5) ◽

pp. 2642-2651 ◽

Cited By ~ 35

Author(s):

Young Suk Kim ◽

Yukihiro Shimogaki

Keyword(s):

Chemical Vapor ◽

Spectroscopic Characterization ◽

Copper Films ◽

X Ray ◽

Adhesion Behavior ◽

Chemical Vapor Deposited

Download Full-text

In situ infrared reflection–absorption spectroscopic characterization of sustained kinetic oscillations in the Pt(100)/NO+CO system

Surface Science ◽

10.1016/s0039-6028(98)00569-x ◽

1998 ◽

Vol 417 (2-3) ◽

pp. 189-200 ◽

Cited By ~ 7

Author(s):

Noel P Magtoto ◽

Hugh H Richardson

Keyword(s):

Spectroscopic Characterization ◽

Infrared Reflection ◽

Kinetic Oscillations

Download Full-text

Characterization of Chemical Vapor Deposited Tetraethyl Orthosilicate based SiO2 Films for Photonic Devices

Materials Science ◽

10.5755/j01.ms.22.1.7245 ◽

2016 ◽

Vol 22 (1) ◽

Author(s):

Jhansirani KOTCHARLAKOTA ◽

Venkata Hari Krishna SRIRAMA ◽

Raghvendra Sarvjeet DUBEY

Keyword(s):

Chemical Vapor ◽

Photonic Devices ◽

Tetraethyl Orthosilicate ◽

Sio2 Films ◽

Chemical Vapor Deposited

Download Full-text

The growth and in situ characterization of chemical vapor deposited SiO2

Journal of Crystal Growth ◽

10.1016/0022-0248(87)90020-0 ◽

1987 ◽

Vol 83 (2) ◽

pp. 290-296 ◽

Cited By ~ 3

Author(s):

R. Iyer ◽

R.R. Chang ◽

D.L. Lile

Keyword(s):

Chemical Vapor ◽

In Situ Characterization ◽

Chemical Vapor Deposited

Download Full-text

In situ photoelectron spectroscopic characterization of c-BN films deposited via plasma enhanced chemical vapor deposition employing fluorine chemistry

Diamond and Related Materials ◽

10.1016/j.diamond.2015.04.002 ◽

2015 ◽

Vol 56 ◽

pp. 13-22 ◽

Cited By ~ 7

Author(s):

Joseph Shammas ◽

Tianyin Sun ◽

Franz A.M. Koeck ◽

Aram Rezikyan ◽

Robert J. Nemanich

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Spectroscopic Characterization ◽

Fluorine Chemistry

Download Full-text

Suppression and characterization of interface states at low-pressure-chemical-vapor-deposited SiN /III-nitride heterostructures

Applied Surface Science ◽

10.1016/j.apsusc.2020.148530 ◽

2021 ◽

Vol 542 ◽

pp. 148530

Author(s):

Kexin Deng ◽

Xinhua Wang ◽

Sen Huang ◽

Haibo Yin ◽

Jie Fan ◽

...

Keyword(s):

Chemical Vapor ◽

Low Pressure ◽

Interface States ◽

Chemical Vapor Deposited ◽

Pressure Chemical

Download Full-text

Characterization of chlorinated chemical vapor deposited and natural (100) diamond

Surface Science ◽

10.1016/s0039-6028(99)00197-1 ◽

1999 ◽

Vol 425 (2-3) ◽

pp. 245-258 ◽

Cited By ~ 10

Author(s):

J.A. Chaney ◽

C.S. Feigerle

Keyword(s):

Chemical Vapor ◽

Chemical Vapor Deposited

Download Full-text

Layer by Layer Characterization of 1-Octadecanol Films on a Au(111) Electrode Surface. “In Situ” Polarization Modulation Infrared Reflection Absorption Spectroscopy and Electrochemical Studies

Langmuir ◽

10.1021/la036352b ◽

2004 ◽

Vol 20 (11) ◽

pp. 4579-4589 ◽

Cited By ~ 20

Author(s):

Izabella Zawisza ◽

Jacek Lipkowski

Keyword(s):

Absorption Spectroscopy ◽

Electrode Surface ◽

Polarization Modulation ◽

Layer By Layer ◽

Electrochemical Studies ◽

Infrared Reflection Absorption Spectroscopy ◽

Infrared Reflection

Download Full-text

Spectroscopic Characterization of Samples from Different Environments in a Volcano-Glacial Region in Iceland: Implications for in situ Planetary Exploration

Spectrochimica Acta Part A Molecular and Biomolecular Spectroscopy ◽

10.1016/j.saa.2021.120205 ◽

2021 ◽

pp. 120205

Author(s):

Dina M. Bower ◽

Clayton S.C. Yang ◽

Tilak Hewagama ◽

Conor A. Nixon ◽

Shahid Aslam ◽

...

Keyword(s):

Spectroscopic Characterization ◽

Planetary Exploration

Download Full-text

Characterization Of A Multiple-Step In-Situ Plasma Enhanced Chemical Vapor Deposition (PECVD) Tetraethylorthosilicate (TEOS) Planarization Scheme For Submicron Manufacturing

10.1117/12.963941 ◽

1990 ◽

Cited By ~ 2

Author(s):

Jeannine M. Perchard ◽

Howard E. Smith ◽

Robert O'Connor ◽

Jeff Olsen ◽

Kam Law

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Multiple Step

Download Full-text