Silver catalyzed ultrathin silicon nanowires grown by low-temperature chemical-vapor-deposition

2010 ◽  
Vol 107 (9) ◽  
pp. 096105 ◽  
Author(s):  
Joerg V. Wittemann ◽  
Wolfram Münchgesang ◽  
Stephan Senz ◽  
Volker Schmidt
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Silicon Nanowires ◽  
Vapor Deposition ◽  
Chemical Vapor

Growth and low temperature photoluminescence of silicon nanowires for different catalysts

2009 ◽  
Vol 1178 ◽  
Author(s):  
Olivier Demichel ◽  
Fabrice Oehler ◽  
Vincent Calvo ◽  
Pierre Noé ◽  
Adrien Besson ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Thermal Oxidation ◽  
Silicon Nanowires ◽  
Vapor Deposition ◽  
Oxidation Process ◽  
Chemical Vapor ◽  
Aqua Regia ◽  
Thermal Oxidation Process ◽  
Low Temperature Photoluminescence

AbstractWe report the growth of silicon nanowires (SiNWs) by chemical vapor deposition (CVD) with several catalysts. We performed low temperature photoluminescence (PL) experiments on as-grown SiNWs for the following catalysts: Au, Cu, TiSi, PdSi and PtSi. Nanowires are chemically treated with an aqua regia solution to remove the catalyst droplets, this step is followed by a thermal oxidation process. We compared the PL of as-grown and processed SiNWs for each catalyst.

scholarly journals Practical Route for the Low-Temperature Growth of Large-Area Bilayer Graphene on Polycrystalline Nickel by Cold-Wall Chemical Vapor Deposition

ACS Omega ◽  
2021 ◽  
Author(s):  
Muhammad Aniq Shazni Mohammad Haniff ◽  
Nur Hamizah Zainal Ariffin ◽  
Poh Choon Ooi ◽  
Mohd Farhanulhakim Mohd Razip Wee ◽  
Mohd Ambri Mohamed ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Bilayer Graphene ◽  
Cold Wall ◽  
Polycrystalline Nickel ◽  
Large Area ◽  
Temperature Growth ◽  
Low Temperature Growth

Low Temperature Chemical Vapor Deposition of Hafnium Nitride−Boron Nitride Nanocomposite Films

2009 ◽  
Vol 21 (23) ◽  
pp. 5601-5606 ◽  
Author(s):  
Navneet Kumar ◽  
Wontae Noh ◽  
Scott R. Daly ◽  
Gregory S. Girolami ◽  
John R. Abelson
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocomposite Films ◽  
Hafnium Nitride

Incorporation of oxygen and chlorine atoms into low‐temperature (850 °C) silicon epitaxial films by chemical vapor deposition

1995 ◽  
Vol 66 (21) ◽  
pp. 2867-2869 ◽  
Author(s):  
Akihiro Miyauchi ◽  
Kazuhiro Ueda ◽  
Yousuke Inoue ◽  
Takaya Suzuki ◽  
Yoshinori Imai
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Epitaxial Films ◽  
Chlorine Atoms
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