Light emitting diode with MOS structures containing multiple-stacked Si quantum dots
(QDs)/SiO2 was fabricated and the visible-infrared light emission was observed a room temperature
when the negative gate bias exceeded the threshold voltage. The luminescence intensity was
increased linearly with increasing the injected current density. The possible luminescence
mechanism was briefly discussed and the delta P doping was performed to obtain the doped Si QDs
and the improvement of EL intensity was demonstrated.