A method of rapidly obtaining concentration‐depth profiles from x‐ray diffraction

1985 ◽  
Vol 58 (3) ◽  
pp. 1095-1101 ◽  
Author(s):  
K. E. Wiedemann ◽  
J. Unnam
Keyword(s):  
X Ray Diffraction ◽  
X Ray ◽  
Depth Profiles ◽  
Concentration Depth Profiles

X-ray diffraction study of concentration depth profiles of binary alloy coatings during thermal diffusion: application to brass coating

1999 ◽  
Vol 32 (1) ◽  
pp. 27-35 ◽  
Author(s):  
B. Bolle ◽  
A. Tidu ◽  
J. J. Heizmann
Keyword(s):  
Thermal Diffusion ◽  
Profile Analysis ◽  
Nondestructive Method ◽  
Line Profile Analysis ◽  
X Ray Diffraction ◽  
X Ray ◽  
Depth Profiles ◽  
Diffraction Line Profile ◽  
Concentration Depth Profile ◽  
Concentration Depth Profiles

Using the Houska method based on X-ray diffraction-line profile analysis, new mathematical treatments are proposed to compute directly the concentration depth profile of thin films obtained by diffusion. As an example, concentration depth profiles of a brass layer have been studied during the thermal diffusion process. This nondestructive method is fast (a few minutes) and allows the sample to be used for complementary analysis if necessary.

Copper(I) Halide Nanoparticle-dispersed Glasses Prepared by Copper Staining

2005 ◽  
Vol 20 (9) ◽  
pp. 2480-2485 ◽  
Author(s):  
Kohei Kadono ◽  
Tatsuya Suetsugu ◽  
Takeshi Ohtani ◽  
Toshihiko Einishi ◽  
Takashi Tarumi ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Heat Treatment ◽  
Surface Region ◽  
Borosilicate Glasses ◽  
X Ray Diffraction ◽  
X Ray ◽  
Depth Profiles ◽  
Transmission Electron ◽  
Heat Treated ◽  
Glass Heat

Copper(I) chloride and bromide nanoparticle-dispersed glasses were prepared by means of a conventional copper staining. The staining was performed by the following process: copper stain was applied on the surfaces of Cl−- or Br−-ion-containing borosilicate glasses, and the glasses were heat-treated at 510 °C for various times. Typical exciton bands observed in the absorption spectra of the glasses after the heat treatment indicated that CuCl and CuBr particles were formed in the surface region of the glasses. The average sizes of the CuCl and CuBr particles in the glasses heat-treated for 48 h were estimated at 4.8 and 2.7 nm, respectively. The nanoparticles were also characterized by x-ray diffraction and transmission electron microscopy. Depth profiles of Cu and CuBr concentration in the glass heat-treated for 48 h were measured. Copper decreased in concentration monotonously with depth, reaching up to 60 μm, while the CuBr concentration had a maximum at about 25 μm in depth.

Analysis of the Strain Profile in Thin Au/Ni Multilayers by X-Ray Diffraction

1990 ◽  
Vol 208 ◽  
Author(s):  
J. Chaudhuri ◽  
V. Gondhalekar ◽  
A. F. Jankowski
Keyword(s):  
Diffraction Pattern ◽  
Diffraction Theory ◽  
Metallic Multilayers ◽  
X Ray Diffraction ◽  
Strain Profile ◽  
X Ray ◽  
Depth Profiles

ABSTRACTA dynamical x-ray diffraction theory has been used to obtain microscopic strain profiles in thin Au/Ni multilayers. Depth profiles of strains in these multilayers, with repeat periodicities varying from 0.82 nm to 9.0 nm, are obtained by an iterative fitting of the calculated diffraction pattern with the experimental one. Interfacial coherency is found to play an important role in understanding the origin of the supermodulus effect in metallic multilayers.

Damage Removal and Activation in Rapid-Thermally-Annealed Silicon Implanted Semi-Insulating GaAs

1988 ◽  
Vol 126 ◽  
Author(s):  
J. L. Tandon ◽  
J. H. Madok ◽  
I. S. Leybovich ◽  
G. Bai
Keyword(s):  
Electron Concentration ◽  
Lattice Strain ◽  
Extended Defects ◽  
Strain Measurements ◽  
X Ray ◽  
Depth Profiles ◽  
Annealing Temperatures ◽  
Implantation Damage ◽  
Long Tails ◽  
Concentration Depth Profiles

ABSTRACTIn the Rapid-Thermal-Annealing of Si-implanted undoped semi-insulating GaAs three regimes are broadly identified. At ˜ 600°C, ion implantation damage is largely removed, as indicated by lattice-strain measurements performed by X-ray rocking curves. Between ˜ 600 – 900°C, “extended defects”, which presumably account for the long tails in the electron concentration depth profiles, are annealed. Higher annealing temperatures in this range result in profiles with successively shorter tails. Finally, beyond ˜ 900°C, “acceptor levels” in the material are revealed, which become effective in compensating the Si activation.

scholarly journals RaDMaX online: a web-based program for the determination of strain and damage profiles in irradiated crystals using X-ray diffraction

2020 ◽  
Vol 53 (2) ◽  
pp. 587-593
Author(s):  
A. Boulle ◽  
V. Mergnac
Keyword(s):  
Web Application ◽  
The Internet ◽  
Programming Environment ◽  
X Ray Diffraction ◽  
Web Browser ◽  
Web Based ◽  
X Ray ◽  
Depth Profiles ◽  
User Friendly

RaDMaX online is a major update to the previously published RaDMaX (radiation damage in materials analysed with X-ray diffraction) software [Souilah, Boulle & Debelle (2016). J. Appl. Cryst. 49, 311–316]. This program features a user-friendly interface that allows retrieval of strain and disorder depth profiles in irradiated crystals from the simulation of X-ray diffraction data recorded in symmetrical θ/2θ mode. As compared with its predecessor, RaDMaX online has been entirely rewritten in order to be able to run within a simple web browser, therefore avoiding the necessity to install any programming environment on the users' computers. The RaDMaX online web application is written in Python and developed within a Jupyter notebook implementing graphical widgets and interactive plots. RaDMaX online is free and open source and can be accessed on the internet at https://aboulle.github.io/RaDMaX-online/.

Development of a Numerical Procedure for Determining the Depth Profiles of X-Ray Diffraction Data

1993 ◽  
Vol 37 ◽  
pp. 197-203 ◽  
Author(s):  
Xiaojing Zhu ◽  
Paul Predecki
Keyword(s):  
Integral Equation ◽  
Diffraction Data ◽  
Linear Equations ◽  
Numerical Procedure ◽  
Grazing Incidence ◽  
Sample Thickness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Depth Profiles ◽  
Data Errors

AbstractA numerical procedure is described and demonstrated for determining z-profiles from measured τ-profiles of diffraction data such as may be obtained by grazing incidence x-ray diffraction (GIXD). The z-profile was approximated by a piece wise linear function and the problem of solving the integral equation for the z-profile was thus converted to one of solving a set of linear equations. With a sufficient number of the linear pieces, the z-pTofile could be accurately determined. The procedure and its sensitivity to data errors was tested with several arbitrarily chosen known functions. It was found that when errors were introduced into either the τ-profile or the sample thickness D the resulting z-profiles become oscillatory.

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