Quantitative analysis of arsenic‐implanted layers in silicon by synchrotron‐radiation‐excited x‐ray fluorescence

1985 ◽  
Vol 58 (1) ◽  
pp. 260-263 ◽  
Author(s):  
D. K. Bowen ◽  
S. T. Davies ◽  
T. Ambridge
1998 ◽  
Vol 144 (1-2) ◽  
pp. 121-136 ◽  
Author(s):  
P Philippot ◽  
B Menez ◽  
P Chevallier ◽  
F Gibert ◽  
F Legrand ◽  
...  

1996 ◽  
Vol 06 (01n02) ◽  
pp. 367-373
Author(s):  
HUIYING YAO ◽  
CHENGZHI JIN ◽  
JINGXIA ZHANG ◽  
BENJIE WU

Application of PiXE On biology, medicine and environment has been successful in the last twenty years. However, with the development of science and technique, lower detectable limit, sub-ppm sensitivity, more accurate quantitative analysis and the element chemical state information were presented which can not be achieved by PIXE. The synchrotron radiation as an excitation source to induce X-ray emission (SXRF) is a very powerful method with all the above requirements. In this paper the advantages of SXRF were discussed and compared with PIXE. The article shows our work on biological field by PIXE and SXRF also.


2003 ◽  
Vol 36 (10A) ◽  
pp. A37-A43 ◽  
Author(s):  
A Elmoutaouakkil ◽  
G Fuchs ◽  
P Bergounhon ◽  
R P res ◽  
F Peyrin

Author(s):  
Anderson Alvarenga de Moura Meneses ◽  
Alessandro Giusti ◽  
Andre Pereira de Almeida ◽  
Liebert Nogueira ◽  
Delson Braz ◽  
...  

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