Interfacial properties of (Al,Ga)As/GaAs structures: Effect of substrate temperature during growth by molecular beam epitaxy

1982 ◽  
Vol 53 (2) ◽  
pp. 1030-1033 ◽  
Author(s):  
H. Morkoç ◽  
T. J. Drummond ◽  
R. Fischer
1991 ◽  
Vol 241 ◽  
Author(s):  
Bijan Tadayon ◽  
Mohammad Fatemi ◽  
Saied Tadayon ◽  
F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


2001 ◽  
Vol 227-228 ◽  
pp. 266-270 ◽  
Author(s):  
Yasuaki Tatsuoka ◽  
Masaya Uemura ◽  
Takahiro Kitada ◽  
Satoshi Shimomura ◽  
Satoshi Hiyamizu

2006 ◽  
Vol 88 (8) ◽  
pp. 082114 ◽  
Author(s):  
A. Armstrong ◽  
C. Poblenz ◽  
D. S. Green ◽  
U. K. Mishra ◽  
J. S. Speck ◽  
...  

1996 ◽  
Vol 68 (6) ◽  
pp. 841-843 ◽  
Author(s):  
C. H. Goo ◽  
W. S. Lau ◽  
T. C. Chong ◽  
L. S. Tan ◽  
Paul K. Chu

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