Analysis of liquid mediated friction during alignment in large area UV imprint lithography

2009 ◽  
Vol 95 (5) ◽  
pp. 053110
Author(s):  
Seock Hwan Kang ◽  
Si Hwan Park ◽  
Woo Il Lee
Keyword(s):  
Imprint Lithography ◽  
Large Area

Large Area Flexible Electronics Fabricated Using Self-Aligned Imprint Lithography

2019 ◽  
Vol 8 (1) ◽  
pp. 199-204 ◽  
Author(s):  
W. Jackson ◽  
Marcia Almanza-Workman ◽  
Alison Chaiken ◽  
Robert Garcia ◽  
Albert Jeans ◽  
...  
Keyword(s):  
Flexible Electronics ◽  
Imprint Lithography ◽  
Large Area

Solvent-infiltration imprint lithography: a novel method to prepare large area poly(3-hexylthiophene) micro/nano-patterns

2012 ◽  
Vol 22 (39) ◽  
pp. 21154 ◽  
Author(s):  
Jinhe Wang ◽  
Guoquan Min ◽  
Zhitang Song ◽  
Xiuyuan Ni ◽  
Weimin Zhou ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Large Area ◽  
Novel Method

Template Fabrication Challenges for Patterned Media

2006 ◽  
Vol 961 ◽  
Author(s):  
Douglas Resnick ◽  
Gerard Schmid ◽  
Mike Miller ◽  
Gary Doyle ◽  
Chris Jones ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
High Resolution ◽  
Photonic Crystals ◽  
Imprint Lithography ◽  
Large Area ◽  
Uv Curable ◽  
Wire Grid ◽  
Patterned Media ◽  
Pattern Density ◽  
Mix And Match

ABSTRACTThe Step and Flash Imprint Lithography (S-FILTM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both patterned media and photonic crystal devices using a large area printing tool developed around the S-FIL process. Techniques for further enhancing the pattern density as well as a method for addressing feature image placement are described. Finally, a process for replicating a Master Template is discussed in detail.

Large Area, Facile Oxide Nanofabrication via Step-and-Flash Imprint Lithography of Metal–Organic Hybrid Resins

2013 ◽  
Vol 5 (24) ◽  
pp. 13113-13123 ◽  
Author(s):  
Saman Safari Dinachali ◽  
Jarrett Dumond ◽  
Mohammad S. M. Saifullah ◽  
Kwadwo Konadu Ansah-Antwi ◽  
Ramakrishnan Ganesan ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Large Area ◽  
Organic Hybrid ◽  
Metal Organic

Development of a very large-area ultraviolet imprint lithography process

2009 ◽  
Vol 86 (10) ◽  
pp. 1983-1988 ◽  
Author(s):  
Ki-don Kim ◽  
Jun-ho Jeong ◽  
Sang-hu Park ◽  
Dae-geun Choi ◽  
Jun-hyuk Choi ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Large Area ◽  
Lithography Process

Large area patterning of residue-free metal oxide nanostructures by liquid transfer imprint lithography

2019 ◽  
Vol 30 (23) ◽  
pp. 235301 ◽  
Author(s):  
Suok Lee ◽  
Sang Hee Jung ◽  
A-Rang Jang ◽  
Seong In Yoon ◽  
Hyeon Suk Shin ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Imprint Lithography ◽  
Large Area ◽  
Oxide Nanostructures ◽  
Metal Oxide Nanostructures ◽  
Liquid Transfer ◽  
Free Metal

scholarly journals Extending the resolution limits of nanoshape imprint lithography using molecular dynamics of polymer crosslinking

2021 ◽  
Vol 7 (1) ◽  
Author(s):  
Anshuman Cherala ◽  
Parth N. Pandya ◽  
Kenneth M. Liechti ◽  
S. V. Sreenivasan
Keyword(s):  
Nanoimprint Lithography ◽  
Random Access ◽  
Radius Of Curvature ◽  
Imprint Lithography ◽  
Simulation Framework ◽  
Resolution Limit ◽  
Large Area ◽  
Good Shape ◽  
Bridge Structures ◽  
Shape Retention

AbstractEmerging nanoscale applications in energy, electronics, optics, and medicine can exhibit enhanced performance by incorporating nanoshaped structures (nanoshape structures here are defined as shapes enabled by sharp corners with radius of curvature < 5 nm). Nanoshaped fabrication at high-throughput is well beyond the capabilities of advanced optical lithography. Although the highest-resolution e-beams and large-area e-beams have a resolution limit of 5 and 18 nm half-pitch lines or 20 nm half-pitch holes, respectively, their low throughput necessitates finding other fabrication techniques. By using nanoimprint lithography followed by metal-assisted chemical etching, diamond-like nanoshapes with ~3 nm radius corners and 100 nm half-pitch over large areas have been previously demonstrated to improve the nanowire capacitor performance (by ~90%). In future dynamic random-access memory (DRAM) nodes (with DRAM being an exemplar CMOS application), the implementation of nanowire capacitors scaled to <15 nm half-pitch is required. To scale nanoshape imprint lithography down to these half-pitch values, the previously established atomistic simulation framework indicates that the current imprint resist materials are unable to retain the nanoshape structures needed for DRAM capacitors. In this study, the previous simulation framework is extended to study improved shape retention by varying the resist formulations and by introducing novel bridge structures in nanoshape imprinting. This simulation study has demonstrated viable approaches to sub-10 nm nanoshaped imprinting with good shape retention, which are matched by experimental data.

Composite imprint lithography for mass producing large-area microstructures

2019 ◽  
Vol 27 (7) ◽  
pp. 1516-1527
Author(s):  
兰红波 LAN Hong-bo ◽  
刘明杨 LIU Ming-yang ◽  
郭良乐 GUO Liang-le ◽  
许 权 XU Quan
Keyword(s):  
Imprint Lithography ◽  
Large Area

scholarly journals System for Fabrication of Large-Area Roll Molds by Step-and-Repeat Liquid Transfer Imprint Lithography

Materials ◽  
2020 ◽  
Vol 13 (8) ◽  
pp. 1938
Author(s):  
Hyungjun Lim ◽  
Sanghee Jung ◽  
Junhyoung Ahn ◽  
Kee-Bong Choi ◽  
Geehong Kim ◽  
...  
Keyword(s):  
Circumferential Direction ◽  
Imprint Lithography ◽  
Large Area ◽  
Efficient Tool ◽  
Lithography Process ◽  
Donor Substrate ◽  
Liquid Transfer ◽  
The Way

The effective production of nanopatterned films generally requires a nanopatterned roll mold with a large area. We report on a novel system to fabricate large-area roll molds by recombination of smaller patterned areas in a step-and-repeat imprint lithography process. The process is accomplished in a method similar to liquid transfer imprint lithography (LTIL). The stamp roll with a smaller area takes up the liquid resist by splitting from a donor substrate or a donor roll. The resist is then transferred from a stamp roll to an acceptor roll and stitched together in a longitudinal and, if necessary, in a circumferential direction. During transfer, the nanostructured resist is UV-exposed and crosslinked directly on the acceptor roll. The acceptor roll with the stitched and recombined stamp patterns is ready to be used as a large-area roll mold for roll-based imprinting. A system for this purpose was designed, and its operation was demonstrated taking the example of an acceptor roll of 1 m length and 250 mm diameter, which was covered by 56 patterned areas. Such a system represents an elegant and efficient tool to recombine small patterned areas directly on a large roll mold and opens the way for large-area roll-based processing.

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