Solvent-infiltration imprint lithography: a novel method to prepare large area poly(3-hexylthiophene) micro/nano-patterns

2012 ◽  
Vol 22 (39) ◽  
pp. 21154 ◽  
Author(s):  
Jinhe Wang ◽  
Guoquan Min ◽  
Zhitang Song ◽  
Xiuyuan Ni ◽  
Weimin Zhou ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Large Area ◽  
Novel Method

Large Area Flexible Electronics Fabricated Using Self-Aligned Imprint Lithography

2019 ◽  
Vol 8 (1) ◽  
pp. 199-204 ◽  
Author(s):  
W. Jackson ◽  
Marcia Almanza-Workman ◽  
Alison Chaiken ◽  
Robert Garcia ◽  
Albert Jeans ◽  
...  
Keyword(s):  
Flexible Electronics ◽  
Imprint Lithography ◽  
Large Area

Analysis of liquid mediated friction during alignment in large area UV imprint lithography

2009 ◽  
Vol 95 (5) ◽  
pp. 053110
Author(s):  
Seock Hwan Kang ◽  
Si Hwan Park ◽  
Woo Il Lee
Keyword(s):  
Imprint Lithography ◽  
Large Area

Template Fabrication Challenges for Patterned Media

2006 ◽  
Vol 961 ◽  
Author(s):  
Douglas Resnick ◽  
Gerard Schmid ◽  
Mike Miller ◽  
Gary Doyle ◽  
Chris Jones ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
High Resolution ◽  
Photonic Crystals ◽  
Imprint Lithography ◽  
Large Area ◽  
Uv Curable ◽  
Wire Grid ◽  
Patterned Media ◽  
Pattern Density ◽  
Mix And Match

ABSTRACTThe Step and Flash Imprint Lithography (S-FILTM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both patterned media and photonic crystal devices using a large area printing tool developed around the S-FIL process. Techniques for further enhancing the pattern density as well as a method for addressing feature image placement are described. Finally, a process for replicating a Master Template is discussed in detail.

Fabrication of a Large-area-patterned Monolayer of Polytetrafluoroethylene Nanoparticles by Surface Charge Induced Colloidal deposition

2014 ◽  
Vol 1663 ◽  
Author(s):  
Chuan Du ◽  
Jiadao Wang ◽  
Darong Chen
Keyword(s):  
Surface Charge ◽  
Formation Mechanism ◽  
Production Efficiency ◽  
Silicon Substrates ◽  
Large Area ◽  
Whole Process ◽  
Colloidal Deposition ◽  
Novel Method ◽  
High Production ◽  
Three Body

ABSTRACTA facile and novel method of fabricating large-area-patterned monolayer of polytetrafluoroethylene(PTFE) nanoparticles was achieved using surface charge induced colloidal deposition. Chemical processes of amination and hydroxylation were used to make the silicon substrates positively and negatively charged, respectively, while the PTFE colloidal nanoparticles were anisotropic and negatively charged. After colloidal deposition, an ordered monolayer with microholes was formed on the amination surface, while an island-like monolayer was achieved on the hydroxylation surface. Both of the two kinds of monolayers were as large as 1.5 square centimeters. It is worth pointing out that these large-area-patterned monolayers were fabricated without any templates and the whole process only took several hours. The formation mechanism of the different structures can be generally attributed to the cooperation and competition of three-body, two-body and particle-wall interactions. It is believed that the interesting patterned monolayer formation mechanism, high production efficiency, good adaptability and quality will make this novel method attractive.

scholarly journals Novel method of large area graphene fabrication

2012 ◽  
Vol 393 ◽  
pp. 012025 ◽  
Author(s):  
A V Frolov ◽  
Yu I Latyshev
Keyword(s):  
Large Area ◽  
Novel Method

Large Area, Facile Oxide Nanofabrication via Step-and-Flash Imprint Lithography of Metal–Organic Hybrid Resins

2013 ◽  
Vol 5 (24) ◽  
pp. 13113-13123 ◽  
Author(s):  
Saman Safari Dinachali ◽  
Jarrett Dumond ◽  
Mohammad S. M. Saifullah ◽  
Kwadwo Konadu Ansah-Antwi ◽  
Ramakrishnan Ganesan ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Large Area ◽  
Organic Hybrid ◽  
Metal Organic

Development of a very large-area ultraviolet imprint lithography process

2009 ◽  
Vol 86 (10) ◽  
pp. 1983-1988 ◽  
Author(s):  
Ki-don Kim ◽  
Jun-ho Jeong ◽  
Sang-hu Park ◽  
Dae-geun Choi ◽  
Jun-hyuk Choi ◽  
...  
Keyword(s):  
Imprint Lithography ◽  
Large Area ◽  
Lithography Process

A Novel Method for Large Area Graphene Transfer on the Polymer Optical Fiber

2012 ◽  
Vol 12 (5) ◽  
pp. 3918-3921 ◽  
Author(s):  
Atul Kulkarni ◽  
Hyeongkeun Kim ◽  
Rashid Amin ◽  
Sung Ha Park ◽  
Byung Hee Hong ◽  
...  
Keyword(s):  
Optical Fiber ◽  
Polymer Optical Fiber ◽  
Large Area ◽  
Novel Method ◽  
Graphene Transfer

A novel method for thickness profile control in RF PECVD deposition on large area substrates

2006 ◽  
Vol 200 (14-15) ◽  
pp. 4339-4344 ◽  
Author(s):  
Y. Yin ◽  
L. Hang ◽  
M. Proschek ◽  
D.R. McKenzie ◽  
M.M.M. Bilek
Keyword(s):  
Large Area ◽  
Thickness Profile ◽  
Profile Control ◽  
Novel Method
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