Effect of molecular beam epitaxy growth conditions on the Bi content of GaAs1−xBix

2008 ◽  
Vol 92 (19) ◽  
pp. 192110 ◽  
Author(s):  
X. Lu ◽  
D. A. Beaton ◽  
R. B. Lewis ◽  
T. Tiedje ◽  
M. B. Whitwick
2008 ◽  
Vol 1080 ◽  
Author(s):  
Kevin Goodman ◽  
Kejia Wang ◽  
Xiangning Luo ◽  
John Simon ◽  
Tom Kosel ◽  
...  

ABSTRACTMolecular beam epitaxy growth of GaN and InGaN nanowires is accomplished on Si (111) substrates using Ga-droplet nucleation. Typical diameters range from 25-80 nm and lengths can be varied by increasing the growth time; the growth rate is ∼0.25 microns/hour. The nanowires have been characterized structurally and optically. Photoluminescence spectra show band-edge emission of GaN nanowires centered at 362 nm at 290 K. Transmission electron microscopy images unveil that the nanowires are highly crystalline, and grow along the 0001 polar direction. Indium has also been successfully incorporated into GaN nanowires by modifying the growth conditions; the InGaN nanowires emit at ∼520 nm, which provides a possible route to solving strain related problems of high In-composition InGaN based efficient green emitters.


2014 ◽  
Vol 116 (23) ◽  
pp. 233504 ◽  
Author(s):  
S. Valdueza-Felip ◽  
E. Bellet-Amalric ◽  
A. Núñez-Cascajero ◽  
Y. Wang ◽  
M.-P. Chauvat ◽  
...  

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