Structural properties of dusty plasma in direct current and radio frequency gas discharges

T. S. Ramazanov; K. N. Dzhumagulova; A. N. Jumabekov; M. K. Dosbolayev

doi:10.1063/1.2918336

Structural properties of dusty plasma in direct current and radio frequency gas discharges

Physics of Plasmas ◽

10.1063/1.2918336 ◽

2008 ◽

Vol 15 (5) ◽

pp. 053704 ◽

Cited By ~ 50

Author(s):

T. S. Ramazanov ◽

K. N. Dzhumagulova ◽

A. N. Jumabekov ◽

M. K. Dosbolayev

Keyword(s):

Radio Frequency ◽

Structural Properties ◽

Dusty Plasma ◽

Direct Current ◽

Gas Discharges

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Influence of thickness on the structural properties of radio-frequency and direct-current magnetron sputtered TiO2 anatase thin films

Thin Solid Films ◽

10.1016/j.tsf.2014.02.048 ◽

2014 ◽

Vol 558 ◽

pp. 443-448 ◽

Cited By ~ 8

Author(s):

S.K. Mukherjee ◽

A. Nebatti ◽

F. Mohtascham ◽

S. Schipporeit ◽

C. Notthoff ◽

...

Keyword(s):

Thin Films ◽

Radio Frequency ◽

Structural Properties ◽

Direct Current ◽

Tio2 Anatase

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Optical and structural properties of ZnO thin films grown by magnetron sputtering: Effect of the radio frequency power

Thin Solid Films ◽

10.1016/j.tsf.2016.08.040 ◽

2016 ◽

Vol 616 ◽

pp. 265-269 ◽

Cited By ~ 11

Author(s):

R.S. Gonçalves ◽

Petrucio Barrozo ◽

F. Cunha

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Structural Properties ◽

Radio Frequency Power ◽

Zno Thin Films ◽

Frequency Power

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Performance Comparison of Phase Change Materials and Metal-Insulator Transition Materials for Direct Current and Radio Frequency Switching Applications

Technologies ◽

10.3390/technologies6020048 ◽

2018 ◽

Vol 6 (2) ◽

pp. 48 ◽

Cited By ~ 7

Author(s):

Protap Mahanta ◽

Mohiuddin Munna ◽

Ronald Coutu

Keyword(s):

Radio Frequency ◽

Phase Change ◽

Direct Current ◽

Phase Change Materials ◽

Performance Comparison ◽

Insulator Transition ◽

Metal Insulator Transition ◽

Metal Insulator

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Direct-current and radio-frequency characterization of submicron striped-channel field effect transistor structures using focused ion beam and electron-beam lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585948 ◽

1992 ◽

Vol 10 (6) ◽

pp. 2945 ◽

Cited By ~ 1

Author(s):

M. M. Hashemi

Keyword(s):

Electron Beam ◽

Radio Frequency ◽

Direct Current ◽

Electron Beam Lithography ◽

Field Effect ◽

Field Effect Transistor ◽

Focused Ion Beam ◽

Ion Beam ◽

Effect Transistor

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A New Automatic Demultiplexing Method for NRZ-OOK Polarization-Division Multiplexed System

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.204-210.1636 ◽

2011 ◽

Vol 204-210 ◽

pp. 1636-1639

Author(s):

Qi Jing ◽

Yong Qing Huang ◽

Yang An Zhang ◽

Ming Lun Zhang ◽

Li Dong Mei

Keyword(s):

Radio Frequency ◽

Direct Current ◽

Beam Splitter ◽

System Simulation ◽

Polarization Controller ◽

Polarization Beam Splitter ◽

Optical Polarization ◽

Control Signals ◽

Detection Window

A new automatic optical polarization demultiplexing method for NRZ-OOK polarization division multiplexed (PDM) system is proposed. The detected power differences of both the direct current (DC) and the radio frequency (RF) are used as control signals which are sensitive to the angles between the polarization controller (PC) and the polarization beam splitter (PBS). The characteristics of those control signals are thoroughly analyzed, and the best RF detection window is calculated out through system simulation.

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Structural properties of GaN and related alloys grown by radio-frequency magnetron sputter epitaxy

Thin Solid Films ◽

10.1016/j.tsf.2007.05.035 ◽

2008 ◽

Vol 516 (10) ◽

pp. 2837-2842 ◽

Cited By ~ 24

Author(s):

Hiroyuki Shinoda ◽

Nobuki Mutsukura

Keyword(s):

Radio Frequency ◽

Structural Properties ◽

Radio Frequency Magnetron ◽

Magnetron Sputter

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Theoretical modeling of time-dependent cataphoretic gas separation in direct-current gas discharges when end volumes are present

Journal of Applied Physics ◽

10.1063/1.327970 ◽

1980 ◽

Vol 51 (5) ◽

pp. 2483 ◽

Cited By ~ 3

Author(s):

Armin Metze ◽

L. M. Chanin

Keyword(s):

Gas Separation ◽

Direct Current ◽

Theoretical Modeling ◽

Time Dependent ◽

Gas Discharges

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Mechanism of Growth of Cr$_{2}$O$_{3}$ Thin Films on ($1\bar{1}02$), ($11\bar{2}0$), and (0001) Surfaces of Sapphire Substrates by Direct Current–Radio Frequency Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.11pg12 ◽

2012 ◽

Vol 51 ◽

pp. 11PG12 ◽

Cited By ~ 1

Author(s):

Nobuyuki Iwata ◽

Takuji Kuroda ◽

Hiroshi Yamamoto

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Direct Current ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Sapphire Substrates ◽

Mechanism Of Growth

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Three dimensional complex plasma structures in a combined radio frequency and direct current discharge

Physics of Plasmas ◽

10.1063/1.4798418 ◽

2013 ◽

Vol 20 (4) ◽

pp. 043701 ◽

Cited By ~ 9

Author(s):

S. Mitic ◽

B. A. Klumov ◽

S. A. Khrapak ◽

G. E. Morfill

Keyword(s):

Radio Frequency ◽

Direct Current ◽

Three Dimensional ◽

Current Discharge ◽

Complex Plasma ◽

Direct Current Discharge

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Silicon rich silicon oxide films deposited by radio frequency plasma enhanced chemical vapor deposition method: Optical and structural properties

Applied Surface Science ◽

10.1016/j.apsusc.2011.05.112 ◽

2011 ◽

Vol 257 (23) ◽

pp. 9717-9723 ◽

Cited By ~ 24

Author(s):

Sumita Mukhopadhyay ◽

Swati Ray

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Structural Properties ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma

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