Influence of thickness on the structural properties of radio-frequency and direct-current magnetron sputtered TiO2 anatase thin films

2014 ◽  
Vol 558 ◽  
pp. 443-448 ◽  
Author(s):  
S.K. Mukherjee ◽  
A. Nebatti ◽  
F. Mohtascham ◽  
S. Schipporeit ◽  
C. Notthoff ◽  
...  
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Structural Properties ◽  
Direct Current ◽  
Tio2 Anatase

Sensitivity of ZnO Based NH3 Sensor by RF Magnetron Sputtering

2012 ◽  
Vol 626 ◽  
pp. 168-172
Author(s):  
Samsiah Ahmad ◽  
Nor Diyana Md Sin ◽  
M.N. Berhan ◽  
Mohamad Rusop
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Structural Properties ◽  
Rf Magnetron Sputtering ◽  
Xrd Analysis ◽  
Zno Thin Films ◽  
Rf Power ◽  
Si Substrates

Zinc Oxide (ZnO) thin films were deposited onto SiO2/Si substrates using radio frequency (RF) magnetron sputtering method as an Ammonia (NH3) sensor. The dependence of RF power (50~300 Watt) on the structural properties and sensitivity of NH3sensor were investigated. XRD analysis shows that regardless of the RF power, all samples display the preferred orientation on the (002) plane. The results show that the ZnO deposited at 200 Watt display the highest sensitivity value which is 44%.

Electrical and structural properties of direct current magnetron sputtered amorphous TiAl thin films

2019 ◽  
Vol 669 ◽  
pp. 169-173 ◽  
Author(s):  
Vl. Kolkovsky ◽  
J.-U. Schmidt ◽  
S. Döring
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Direct Current

Stereometric analysis of Ti 1− x Al x N thin films deposited by direct current/radio frequency magnetron sputtering

2021 ◽  
Author(s):  
Robert Saraiva Matos ◽  
Henrique Duarte Fonseca Filho ◽  
Abhijeet Das ◽  
Sanjeev Kumar ◽  
Vipin Chawla ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Direct Current ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering

scholarly journals Magnetic and structural properties of iron nitride thin films obtained by argon‐nitrogen reactive radio‐frequency sputtering

1995 ◽  
Vol 77 (10) ◽  
pp. 5309-5313 ◽  
Author(s):  
J.‐F. Bobo ◽  
H. Chatbi ◽  
M. Vergnat ◽  
L. Hennet ◽  
O. Lenoble ◽  
...  
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Structural Properties ◽  
Iron Nitride ◽  
Radio Frequency Sputtering
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