An evaluation of thermal stability of TiB2 metal gate on Hf silicate for p-channel metal oxide semiconductor application

2008 ◽  
Vol 92 (17) ◽  
pp. 172106 ◽  
Author(s):  
S. Y. Son ◽  
P. Kumar ◽  
H. Cho ◽  
K. J. Min ◽  
C. J. Kang ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Metal Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Metal Gate ◽  
Thermal Stability Of

Effect of nitrogen content in HfxTayN metal gate on work function and thermal stability of advanced metal-oxide-semiconductor devices

2007 ◽  
Vol 90 (13) ◽  
pp. 132101 ◽  
Author(s):  
Ping-Hung Tsai ◽  
Kuei-Shu Chang-Liao ◽  
Tzu-Cheng Wang ◽  
Tien-Ko Wang ◽  
Chuen-Horng Tsai ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Metal Oxide ◽  
Work Function ◽  
Nitrogen Content ◽  
Semiconductor Devices ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Metal Gate ◽  
Thermal Stability Of

Thermal stability of nanoscale Ge metal-oxide-semiconductor capacitors with ZrO2 high-k gate dielectrics on Ge epitaxial layers

2007 ◽  
Vol 90 (20) ◽  
pp. 202102 ◽  
Author(s):  
Jungwoo Oh ◽  
Prashant Majhi ◽  
Chang Yong Kang ◽  
Ji-Woon Yang ◽  
Hsing-Huang Tseng ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Metal Oxide ◽  
Gate Dielectrics ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Epitaxial Layers ◽  
High K ◽  
Thermal Stability Of

Impact of Thermal Stability on the Characteristics of Complementary Metal Oxide Semiconductor Transistors with TiN Metal Gate

2002 ◽  
Vol 41 (Part 1, No. 2A) ◽  
pp. 546-551 ◽  
Author(s):  
Meng-Fan Wang ◽  
Tiao-Yuan Huang ◽  
Ya-Chen Kao ◽  
Horng-Chih Lin ◽  
Chun-Yen Chang
Keyword(s):  
Thermal Stability ◽  
Metal Oxide ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Metal Gate ◽  
Tin Metal
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