The role of dislocations as nonradiative recombination centers in InGaN quantum wells

2008 ◽  
Vol 92 (9) ◽  
pp. 091901 ◽  
Author(s):  
Josh Abell ◽  
T. D. Moustakas
2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Agata Bojarska-Cieślińska ◽  
Łucja Marona ◽  
Julita Smalc-Koziorowska ◽  
Szymon Grzanka ◽  
Jan Weyher ◽  
...  

AbstractIn this work we investigate the role of threading dislocations in nitride light emitters with different indium composition. We compare the properties of laser diodes grown on the low defect density GaN substrate with their counterparts grown on sapphire substrate in the same epitaxial process. All structures were produced by metalorganic vapour phase epitaxy and emit light in the range 383–477 nm. We observe that intensity of electroluminescence is strong in the whole spectral region for devices grown on GaN, but decreases rapidly for the devices on sapphire and emitting at wavelength shorter than 420 nm. We interpret this behaviour in terms of increasing importance of dislocation related nonradiative recombination for low indium content structures. Our studies show that edge dislocations are the main source of nonradiative recombination. We observe that long wavelength emitting structures are characterized by higher average light intensity in cathodoluminescence and better thermal stability. These findings indicate that diffusion path of carriers in these samples is shorter, limiting the amount of carriers reaching nonradiative recombination centers. According to TEM images only mixed dislocations open into the V-pits, usually above the multi quantum wells thus not influencing directly the emission.


2021 ◽  
Vol 13 (6) ◽  
pp. 7476-7484
Author(s):  
Julita Smalc-Koziorowska ◽  
Ewa Grzanka ◽  
Artur Lachowski ◽  
Roman Hrytsak ◽  
Mikolaj Grabowski ◽  
...  

2019 ◽  
Vol 58 (SC) ◽  
pp. SCCB37 ◽  
Author(s):  
M. Ismail Hossain ◽  
Yuri Itokazu ◽  
Shunsuke Kuwaba ◽  
Norihiko Kamata ◽  
Noritoshi Maeda ◽  
...  

Author(s):  
Norihiko Kamata ◽  
Abu Zafor Md. Touhidul Islam

We have developed an optical method of detecting and characterizing nonradiative recombination (NRR) centers without electrical contact. The method combines a below-gap excitation (BGE) light with a conventional above-gap excitation light in photoluminescence (PL) measurement, and discriminates the PL intensity change due to switching on and off the BGE. A quantitative analysis of the detected NRR centers became possible by utilizing the saturating tendency of the PL intensity change with increasing the BGE density due to trap filling effect. Some experimental results of AlGaAs, InGaN, and AlGaN quantum wells were shown to allocate the development and present status as well as to exemplify their interpretations.


2014 ◽  
Vol 11 (3-4) ◽  
pp. 832-835 ◽  
Author(s):  
A. Z. M. Touhidul Islam ◽  
N. Murakoshi ◽  
T. Fukuda ◽  
H. Hirayama ◽  
N. Kamata

1993 ◽  
Vol 63 (22) ◽  
pp. 3023-3025 ◽  
Author(s):  
S. Guha ◽  
J. M. DePuydt ◽  
J. Qiu ◽  
G. E. Hofler ◽  
M. A. Haase ◽  
...  

Author(s):  
Shigefusa F. Chichibu ◽  
Hideto MIYAKE ◽  
Akira Uedono

Abstract To give a clue for increasing emission efficiencies of Al x Ga1-x N-based deep ultraviolet light emitters, the origins and influences on carrier concentration and minority carrier lifetime (τminority), which determines the internal quantum efficiency, of midgap recombination centers in c-plane Si-doped Al0.60Ga0.40N epilayers and Al0.68Ga0.32N quantum wells (QWs) grown by metalorganic vapor phase epitaxy were studied by temporally and spatially resolved luminescence measurements, making a correlation with the results of positron annihilation measurement. For the Al0.60Ga0.40N epilayers, τminority decreased as the concentration of cation vacancies (VIII) increased, indicating that VIII, most probably decorated with nitrogen vacancies (VN), VIII(VN) n , are major nonradiative recombination centers (NRCs). For heavily Si-doped Al0.60Ga0.40N, a generation of electron-compensating complexes (VIII-SiIII) is suggested. For lightly Si-doping regime, τminority of the QW emission was increased by appropriate Si-doping in the wells, which simultaneously increased the terrace width. The importance of wetting conditions is suggested for decreasing the NRC concentration.


1992 ◽  
Vol 262 ◽  
Author(s):  
S. M. Lord ◽  
G. Roos ◽  
B. Pezeshki ◽  
J. S. Harris ◽  
N. M. Johnson

ABSTRACTThe effect of the diffusion of monatomic hydrogen into InGaAs/AlGaAs quantum wells has been investigated using photoluminescence (PL) and Secondary Ion Mass Spectroscopy (SIMS). The structures were grown by molecular beam epitaxy and hydrogenated with a remote plasma. For In0.2Ga0.8AlxGA1-xAs quantum wells, hydrogenation significant increases the integrated PL intensity from bound excitons at 77 K. The enhancement of the PL is ascribed to removal of nonradiative recombination centers by hydrogen passivation of defects either at the heterojunction interface or within the epilayers. This PL enhancement (and defect passivation) increases as the Al concentration in the AlGaAs layers increases from 0 to 33 at%. A 50% increase of PL intensity is observed for InGaAs/GaAs. For 33 at%, the increase is a factor of 9. We also diffused deuterium into these InGaAs/AlGaAs quantum wells. The enhancement of the PL by deuteration was similar to that by hydrogenation. The isotopie substitution permits the determination of the depth distribution of deuterium in the multilayered structure by SIMS. SIMS results support the conclusion that more defects are passivated in the higher Al concentration samples.


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