Deep level photothermal spectroscopy: Physical principles and applications to semi-insulating GaAs band-gap multiple trap states

2008 ◽  
Vol 103 (4) ◽  
pp. 043704 ◽  
Author(s):  
Andreas Mandelis ◽  
Jun Xia
2018 ◽  
Vol 924 ◽  
pp. 289-292
Author(s):  
Yuji Yamagishi ◽  
Yasuo Cho

We demonstrate our new local deep level spectroscopy system improved for more accurate analysis of trap states at SiO2/4H-SiC interfaces. Full waveforms of the local capacitance transient with the amplitude of attofarads and the time scale of microseconds were obtained and quantitatively analyzed. The local energy distribution of interface state density in the energy range of EC − Eit = 0.31–0.38 eV was obtained. Two-dimensional mapping of the interface states showed inhomogeneous contrasts with the lateral spatial scale of several hundreds of nanometers, suggesting that the physical origin of the trap states at SiO2/SiC interfaces is likely to be microscopically clustered.


1995 ◽  
Vol 395 ◽  
Author(s):  
U. Rossner ◽  
J.-L. Rouviere ◽  
A. Bourret ◽  
A. Barski

ABSTRACTElectron Cyclotron Resonance Plasma Assisted Molecular Beam Epitaxy (ECR-MBE) and Gas Source Molecular Beam Epitaxy (GSMBE) have been used to grow hexagonal GaN on Si (111). In the ECR-MBE configuration high purity nitrogen has been used as nitrogen source. In GSMBE ammonia was supplied directly to the substrate to be thermally cracked in the presence of gallium.By a combined application of in-situ reflection high-energy electron-diffraction (RHEED) and cross-sectional transmission electron microscopy (TEM) the growth mode and structure of GaN were determined. The growth mode strongly depends on growth conditions. Quasi two dimensional growth was observed in ECR-MBE configuration for a substrate temperature of 640°C while three dimensional growth occured in GSMBE configuration in the temperature range from 640 to 800°C.Low temperature (9 K) photoluminescence spectra show that for samples grown by ECR-MBE and GSMBE a strong near band gap emission peak dominates while transitions due to deep level states are hardly detectable. The best optical results (the highest near band gap emission peak intensity) have been observed for samples grown by GSMBE at high temperature (800°C). This could be explained by the increase of grain dimensions (up to 0,3 – 0,5 μm) observed in samples grown by GSMBE at 800°C.


2020 ◽  
Vol 153 (12) ◽  
pp. 124703
Author(s):  
Weitao Lian ◽  
Rongfeng Tang ◽  
Yuyuan Ma ◽  
Chunyan Wu ◽  
Chao Chen ◽  
...  

2005 ◽  
Vol 97 (8) ◽  
pp. 083529 ◽  
Author(s):  
A. Armstrong ◽  
A. R. Arehart ◽  
S. A. Ringel

1989 ◽  
Vol 163 ◽  
Author(s):  
John D. Dow ◽  
Shang Yuan Ren ◽  
Jun Shen ◽  
Min-Hsiung Tsai

AbstractThe physics of deep levels in semiconductors is reviewed, with emphasis on the fact that all substitutional impurities produce deep levels - some of which may not lie within the fundamental band gap. The character of a dopant changes when one of the deep levels moves into or out of the fundamental gap in response to a perturbation such as pressure or change of host composition. For example, Si on a Ga site in GaAs is a shallow donor, but becomes a deep trap for x>0.3 in AℓxGa1-xAs. Such shallow-deep transitions can be induced in superlattices by changing the period-widths and quantum confinement. A good rule of thumb for deep levels in superlattices is that the energy levels with respect to vacuum are relatively insensitive (on a >0.1 eV scale) to superlattice period-widths, but that the band edges of the superlattices are sensitive to changes of period. Hence the deep level positions relative to the band edges are sensitive to the period-widths, and shallow-deep transitions can be induced by band-gap engineering the superlattice periods.


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