scholarly journals Dielectric properties of hydrogen-incorporated chemical vapor deposited diamond thin films

2007 ◽  
Vol 102 (7) ◽  
pp. 074115 ◽  
Author(s):  
Chao Liu ◽  
Xingcheng Xiao ◽  
Jian Wang ◽  
Bing Shi ◽  
Vivekananda P. Adiga ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited ◽  
Diamond Thin Films

Plasma etched polycrystalline hot‐filament chemical vapor deposited diamond thin films and their electrical characteristics

1994 ◽  
Vol 65 (22) ◽  
pp. 2827-2829 ◽  
Author(s):  
B. Y. Liaw ◽  
T. Stacy ◽  
G. Zhao ◽  
E. J. Charlson ◽  
E. M. Charlson ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Chemical Vapor Deposited ◽  
Diamond Thin Films ◽  
Hot Filament

Low Volume Resistivity Chemical Vapor Deposited Boron Doped Polycrystalline Thin Diamond Film Growth on Sapphire

1996 ◽  
Vol 423 ◽  
Author(s):  
Hassan Golestanian ◽  
S. Mirzakuchaki ◽  
E. J. Charlson ◽  
T. Stacy ◽  
E. M. Charlson
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Volume Resistivity ◽  
X Ray Diffraction ◽  
X Ray ◽  
Boron Doped ◽  
Chemical Vapor Deposited ◽  
Low Volume ◽  
Diamond Thin Films

AbstractHot-filament chemical vapor deposited (HFCVD) boron doped polycrystalline diamond thin films having low volume resistivity were grown on sapphire. The films were characterized using scanning electron microscope (SEM), X-ray diffraction, and current-voltage measurements. SEM micrographs show good crystalline structure with preferred (100) orientation normal to the surface of the film. X-ray diffraction pattern revealed diamond characteristics with the four typical diamond peaks present. Finally, the obtained I-V characteristics indicated that the film's volume resistivity is at least two orders of magnitude lower than those of HFCVD polycrystalline diamond thin films grown on silicon under similar growth conditions.

Frictional properties of chemical vapor deposited diamond thin films

1990 ◽  
Vol 9 (2-3) ◽  
pp. 80-82 ◽  
Author(s):  
Masao Kohzaki ◽  
Kazuo Higuchi ◽  
Shoji Noda
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Frictional Properties ◽  
Chemical Vapor Deposited ◽  
Diamond Thin Films

The relationship between chemical structure and dielectric properties of plasma-enhanced chemical vapor deposited polymer thin films

2007 ◽  
Vol 515 (7-8) ◽  
pp. 3513-3520 ◽  
Author(s):  
Hao Jiang ◽  
Lianggou Hong ◽  
N. Venkatasubramanian ◽  
John T. Grant ◽  
Kurt Eyink ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Chemical Structure ◽  
Polymer Thin Films ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited ◽  
The Relationship

The Effects of Pretreatment,CH4Gas Ratio and Bias Potential on the Microstructure of Microwave Plasma Enhanced Chemical Vapor Deposited Diamond Thin Films

1997 ◽  
Vol 36 (Part 1, No. 3A) ◽  
pp. 1238-1244 ◽  
Author(s):  
Jong-Wan Park ◽  
You-Kee Lee ◽  
Sei-Hyun Lee ◽  
Kwang-Joon Cho ◽  
Jae-Suk Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Bias Potential ◽  
Chemical Vapor Deposited ◽  
Diamond Thin Films
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