Development and Trial Measurements of Hard X-ray Photoelectron Emission Microscope

2007 ◽  
Author(s):  
T. Taniuchi ◽  
T. Wakita ◽  
M. Takagaki ◽  
N. Kawamura ◽  
M. Suzuki ◽  
...  
Keyword(s):  
Photoelectron Emission ◽  
X Ray ◽  
Photoelectron Emission Microscope

Mephisto: A Novel Synchrotron Imaging Photoelectron Spectromicroscope

1998 ◽  
Vol 4 (S2) ◽  
pp. 358-359
Author(s):  
Gelsomina De Stasio
Keyword(s):  
Dynamic Range ◽  
Chemical Imaging ◽  
Electron Optics ◽  
Photoelectron Emission ◽  
User Friendliness ◽  
X Ray ◽  
New Instrument ◽  
Electron Imaging ◽  
X Ray Absorption ◽  
Photoelectron Emission Microscope

We discuss the scheme and test performances of the recently commissioned MEPHISTO system in its final configuration. The tests show that the improvements in the electron optics system with respect to other instruments in the same class made it possible to reach lateral resolutions in the 50 nm range. They also demonstrate rather good spectromicroscopy and spectroscopy performances, reliability and flexibility of operation.This instrument belongs to the class of the electron-imaging systems, like the PEEM (PhotoElectron Emission Microscope) [1] and the X-PEEM (X-ray PhotoElectron Emission Microscope) Microscope [2-5], Our new instrument, called MEPHISTO from the French acronym “Microscope a Emission de Photo électrons par Illumination Synchrotronique de type Onduleur” (Photoelectron Emission Microscope by Synchrotron Undulator Illumination) shares the good characteristics of the instruments of its class: real-time chemical imaging, fast taking of local x-ray absorption spectra, high spatial resolution, large dynamic range, flexibility and user-friendliness.

scholarly journals Thermal Analysis of Photoelectron Emission (PE) and X-ray Photoelectron Spectroscopy (XPS) Data for Iron Surfaces Scratched in Air, Water, and Liquid Organics

2020 ◽  
Vol 10 (6) ◽  
pp. 2111
Author(s):  
Yoshihiro Momose ◽  
Takao Sakurai ◽  
Keiji Nakayama
Keyword(s):  
Photoelectron Spectroscopy ◽  
Geiger Counter ◽  
Activation Energies ◽  
Quantum Yields ◽  
Photoelectron Emission ◽  
Base Interaction ◽  
X Ray ◽  
Electron Photoemission ◽  
Environment Dependence ◽  
Wavelength Light

Little is known about the temperature dependence of electron transfer occurring at real metal surfaces. For iron surfaces scratched in seven environments, we report Arrhenius activation energies obtained from the data of photoelectron emission (PE) and X-ray photoelectron spectroscopy (XPS). The environments were air, benzene, cyclohexane, water, methanol, ethanol, and acetone. PE was measured using a modified Geiger counter during repeated temperature scans in the 25–339 °C range under 210-nm-wavelength light irradiation and during light wavelength scans in the range 300 to 200 nm at 25, 200, and 339 °C. The standard XPS measurement of Fe 2p, Fe 3p, O 1s, and C 1s spectra was conducted after wavelength scan. The total number of electrons counted in the XPS measurement of the core spectra, which was called XPS intensity, strongly depended on the environments. The PE quantum yields during the temperature scan increased with temperature, and its activation energies (ΔEaUp1) strongly depended on the environment, being in the range of 0.212 to 0.035 eV. The electron photoemission probability (αA) obtained from the PE during the wavelength scan increased with temperature, and its activation energies (ΔEαA) were almost independent of the environments, being in the range of 0.113–0.074 eV. The environment dependence of the PE behavior obtained from temperature and wavelength scans was closely related to that of the XPS characteristics, in particular, the XPS intensities of O 1s and the O2− component of the O 1s spectrum, the acid–base interaction between the environment molecule and Fe–OH, and the growth of non-stoichiometric FexO. Furthermore, the origin of the αA was attributed to the escape depth of hot electrons across the overlayer.

Generalized description of magnetic x-ray circular dichroism in Fe 3p photoelectron emission

1997 ◽  
Vol 15 (3) ◽  
pp. 1766-1769 ◽  
Author(s):  
J. G. Tobin ◽  
K. W. Goodman ◽  
F. O. Schumann ◽  
R. F. Willis ◽  
J. B. Kortright ◽  
...  
Keyword(s):  
Circular Dichroism ◽  
Photoelectron Emission ◽  
X Ray ◽  
Circular Dichroïsm
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