High filling fraction gallium phosphide inverse opals by atomic layer deposition

2006 ◽  
Vol 89 (21) ◽  
pp. 211102 ◽  
Author(s):  
E. Graugnard ◽  
V. Chawla ◽  
D. Lorang ◽  
C. J. Summers
Keyword(s):  
Atomic Layer Deposition ◽  
Gallium Phosphide ◽  
Atomic Layer ◽  
Filling Fraction ◽  
Inverse Opals ◽  
Layer Deposition

TiO2 Inverse Opals Fabricated Using Low-Temperature Atomic Layer Deposition

2005 ◽  
Vol 17 (8) ◽  
pp. 1010-1013 ◽  
Author(s):  
J. S. King ◽  
E. Graugnard ◽  
C. J. Summers
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Inverse Opals ◽  
Layer Deposition

High-filling-fraction inverted ZnS opals fabricated by atomic layer deposition

2003 ◽  
Vol 83 (13) ◽  
pp. 2566-2568 ◽  
Author(s):  
J. S. King ◽  
C. W. Neff ◽  
C. J. Summers ◽  
W. Park ◽  
S. Blomquist ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Filling Fraction ◽  
Layer Deposition

scholarly journals Application of in situ and ex situ Characterization of Atomic Layer Deposition Processes for Gallium Phosphide and Sodium Fluoride

2021 ◽  
Author(s):  
Sara Rose Kuraitis
Keyword(s):  
Atomic Layer Deposition ◽  
Sodium Fluoride ◽  
Gallium Phosphide ◽  
Semiconductor Device ◽  
Substrate Surface ◽  
Atomic Layer ◽  
Ex Situ ◽  
Layer By Layer ◽  
Layer Deposition ◽  
Vapor Deposition Technique

Atomic layer deposition (ALD) is a vapor deposition technique for synthesizing thin films with nanometer thickness control. ALD films are deposited on a substrate surface in a cyclic layer-by-layer fashion utilizing alternating doses of highly reactive chemical precursors. Precursors are selected to undergo self-limiting chemical reactions with the surface, and desired film thickness is achieved by varying the number of ALD cycles accordingly. Optimization of ALD process parameters and precursor chemistry enables conformal coating of arbitrary substrate geometries, including high aspect ratio features such as trenches. In the decades since its introduction, ALD has been used for applications across many industries, including semiconductor device manufacturing, emerging battery technologies, and optoelectronics. In this work, I present investigation of two previously reported chemistries for ALD of gallium phosphide (GaP), as well as improvements made to a custom ALD reactor to facilitate better process control and characterization. I also present a new process for thermal ALD of sodium fluoride (NaF), with potential applications in electrode coatings for sodium-ion batteries. To my knowledge, this is the first report of NaF ALD. Finally, I summarize obstacles which may be addressed in future studies that build upon this work.

Optical and Crystallographic Properties of Inverse Opal Photonic Crystals Grown by Atomic Layer Deposition

2003 ◽  
Vol 797 ◽  
Author(s):  
Jeffrey S. King ◽  
Curtis W. Neff ◽  
Dawn L. Heineman ◽  
Elton D. Graugnard ◽  
Christopher J. Summers
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Inverse Opal ◽  
Reflection Spectroscopy ◽  
Void Space ◽  
Inverse Opals ◽  
Layer Deposition ◽  
Photonic Band ◽  
Post Deposition ◽  
Opal Template

ABSTRACTWe report a technique for the formation of infiltrated and inverse opal structures that produces high quality, low porosity conformal material structures. ZnS:Mn and TiO2 were deposited within the void space of an opal lattice by atomic layer deposition. The resulting structures were etched with HF to remove the silica opal template. Infiltrated and inverse opals were characterized by SEM, XRD, and transmission/reflection spectroscopy. The reflectance spectra exhibited features corresponding to strong low and high order photonic band gaps in the (111) direction (γ-L). In addition, deliberate partial infiltrations and multi-layered inverse opals have been formed. The effectiveness of a post-deposition heat treatment for converting TiO2 films to rutile was also studied.

Atomic Layer Deposition of Inverse Opals for Solar Cell Applications

2013 ◽  
Vol 789 ◽  
pp. 3-7 ◽  
Author(s):  
Siva Krishna Karuturi ◽  
Li Jun Liu ◽  
Liap Tat Su ◽  
Wen Bin Niu ◽  
Alfred Ling Yoong Tok
Keyword(s):  
Atomic Layer Deposition ◽  
Present Report ◽  
Dye Sensitized Solar Cells ◽  
Atomic Layer ◽  
Flow Process ◽  
Inverse Opals ◽  
Dye Sensitized ◽  
Layer Deposition ◽  
Conventional Solution ◽  
Sensitized Solar Cells

Atomic layer deposition (ALD) technique shows superior application in the fabrication of TiO2 inverse opals (IO), compared with conventional infiltration methods. In the present report, TiO2 IO structures were infiltrated by ALD method in a continuous-flow and internally developed stop-flow process, respectively. The corresponding optical and optoelectrical properties of TiO2 IO structures were investigated. The prepared uniform IO structure of 288 nm was used as a photoanode for dye-sensitized solar cells. An efficiency of 2.22% was achieved, which was much higher than that of prepared by conventional solution-infiltration method. It is indicated that ALD method is an effective approach for fabricating TiO2 IO photoanode.

Tailoring the Pore Size and Architecture of CeO2/TiO2Core/Shell Inverse Opals by Atomic Layer Deposition

Small ◽  
2009 ◽  
Vol 5 (3) ◽  
pp. 336-340 ◽  
Author(s):  
Ivano Alessandri ◽  
Marcello Zucca ◽  
Matteo Ferroni ◽  
Elza Bontempi ◽  
Laura E. Depero ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Pore Size ◽  
Atomic Layer ◽  
Inverse Opals ◽  
Layer Deposition

High-quality ZnO inverse opals and related heterostructures as photocatalysts produced by atomic layer deposition

2018 ◽  
Vol 454 ◽  
pp. 112-120 ◽  
Author(s):  
Jie Long ◽  
Ming Fu ◽  
Caixia Li ◽  
Cuifeng Sun ◽  
Dawei He ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
High Quality ◽  
Inverse Opals ◽  
Layer Deposition

Tungsten Nitride Inverse Opals by Atomic Layer Deposition

Nano Letters ◽  
2003 ◽  
Vol 3 (9) ◽  
pp. 1293-1297 ◽  
Author(s):  
Alessandro Rugge ◽  
Jill S. Becker ◽  
Roy G. Gordon ◽  
Sarah H. Tolbert
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tungsten Nitride ◽  
Inverse Opals ◽  
Layer Deposition
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