Tungsten Nitride Inverse Opals by Atomic Layer Deposition

Nano Letters ◽  
2003 ◽  
Vol 3 (9) ◽  
pp. 1293-1297 ◽  
Author(s):  
Alessandro Rugge ◽  
Jill S. Becker ◽  
Roy G. Gordon ◽  
Sarah H. Tolbert
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tungsten Nitride ◽  
Inverse Opals ◽  
Layer Deposition

TiO2 Inverse Opals Fabricated Using Low-Temperature Atomic Layer Deposition

2005 ◽  
Vol 17 (8) ◽  
pp. 1010-1013 ◽  
Author(s):  
J. S. King ◽  
E. Graugnard ◽  
C. J. Summers
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Inverse Opals ◽  
Layer Deposition

scholarly journals Atomic layer deposition of tungsten nitride films as protective barriers to hydrogen

2020 ◽  
Vol 507 ◽  
pp. 145019
Author(s):  
Sarah K. Bull ◽  
W. Wilson McNeary ◽  
Cynthia A. Adkins ◽  
Theodore A. Champ ◽  
Chanel A. Hill ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tungsten Nitride ◽  
Layer Deposition

A low valent metalorganic precursor for the growth of tungsten nitride thin films by atomic layer deposition

2007 ◽  
Vol 17 (11) ◽  
pp. 1109 ◽  
Author(s):  
Charles L. Dezelah ◽  
Oussama M. El-Kadri ◽  
Kaupo Kukli ◽  
Kai Arstila ◽  
Ronald J. Baird ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tungsten Nitride ◽  
Layer Deposition ◽  
Low Valent

scholarly journals Improved durability and activity of Pt/C catalysts through atomic layer deposition of tungsten nitride and subsequent thermal treatment

2019 ◽  
Vol 254 ◽  
pp. 587-593 ◽  
Author(s):  
W. Wilson McNeary ◽  
Sarah F. Zaccarine ◽  
Annika Lai ◽  
Audrey E. Linico ◽  
Svitlana Pylypenko ◽  
...  
Keyword(s):  
Thermal Treatment ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tungsten Nitride ◽  
Subsequent Thermal Treatment ◽  
Layer Deposition

Plasma-enhanced atomic layer deposition of tungsten nitride

2016 ◽  
Vol 34 (5) ◽  
pp. 051516 ◽  
Author(s):  
Mark J. Sowa ◽  
Yonas Yemane ◽  
Fritz B. Prinz ◽  
J Provine
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tungsten Nitride ◽  
Layer Deposition

Optical and Crystallographic Properties of Inverse Opal Photonic Crystals Grown by Atomic Layer Deposition

2003 ◽  
Vol 797 ◽  
Author(s):  
Jeffrey S. King ◽  
Curtis W. Neff ◽  
Dawn L. Heineman ◽  
Elton D. Graugnard ◽  
Christopher J. Summers
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Inverse Opal ◽  
Reflection Spectroscopy ◽  
Void Space ◽  
Inverse Opals ◽  
Layer Deposition ◽  
Photonic Band ◽  
Post Deposition ◽  
Opal Template

ABSTRACTWe report a technique for the formation of infiltrated and inverse opal structures that produces high quality, low porosity conformal material structures. ZnS:Mn and TiO2 were deposited within the void space of an opal lattice by atomic layer deposition. The resulting structures were etched with HF to remove the silica opal template. Infiltrated and inverse opals were characterized by SEM, XRD, and transmission/reflection spectroscopy. The reflectance spectra exhibited features corresponding to strong low and high order photonic band gaps in the (111) direction (γ-L). In addition, deliberate partial infiltrations and multi-layered inverse opals have been formed. The effectiveness of a post-deposition heat treatment for converting TiO2 films to rutile was also studied.

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