High-performance GaAs metal-insulator-semiconductor field-effect transistors enabled by self-assembled nanodielectrics

2006 ◽  
Vol 89 (14) ◽  
pp. 142101 ◽  
Author(s):  
H. C. Lin ◽  
P. D. Ye ◽  
Y. Xuan ◽  
G. Lu ◽  
A. Facchetti ◽  
...  
2006 ◽  
Vol 89 (5) ◽  
pp. 053502 ◽  
Author(s):  
Shigehiko Sasa ◽  
Masashi Ozaki ◽  
Kazuto Koike ◽  
Mitsuaki Yano ◽  
Masataka Inoue

2010 ◽  
Vol 97 (25) ◽  
pp. 253502 ◽  
Author(s):  
Yuji Urabe ◽  
Masafumi Yokoyama ◽  
Hideki Takagi ◽  
Tetsuji Yasuda ◽  
Noriyuki Miyata ◽  
...  

Nano Letters ◽  
2007 ◽  
Vol 7 (1) ◽  
pp. 22-27 ◽  
Author(s):  
Ralf Thomas Weitz ◽  
Ute Zschieschang ◽  
Franz Effenberger ◽  
Hagen Klauk ◽  
Marko Burghard ◽  
...  

2019 ◽  
Vol 7 (29) ◽  
pp. 8855-8860 ◽  
Author(s):  
Janghyuk Kim ◽  
Marko J. Tadjer ◽  
Michael A. Mastro ◽  
Jihyun Kim

The threshold voltage of β-Ga2O3 metal–insulator–semiconductor field-effect transistors is controlled via remote fluorine plasma treatment, enabling an enhancement-mode operation under double gate condition.


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