Formation of p-type MgZnO by nitrogen doping

2006 ◽  
Vol 89 (10) ◽  
pp. 102104 ◽  
Author(s):  
Z. P. Wei ◽  
B. Yao ◽  
Z. Z. Zhang ◽  
Y. M. Lu ◽  
D. Z. Shen ◽  
...  
Keyword(s):  
2009 ◽  
Vol 95 (22) ◽  
pp. 222112 ◽  
Author(s):  
S. S. Pan ◽  
G. H. Li ◽  
L. B. Wang ◽  
Y. D. Shen ◽  
Y. Wang ◽  
...  

2010 ◽  
Vol 114 (17) ◽  
pp. 7980-7985 ◽  
Author(s):  
Shanying Li ◽  
Yang Jiang ◽  
Di Wu ◽  
Li Wang ◽  
Honghai Zhong ◽  
...  

2009 ◽  
Vol 94 (2) ◽  
pp. 022111 ◽  
Author(s):  
Yoshitaka Nakano ◽  
Shu Saeki ◽  
Takeshi Morikawa

2007 ◽  
Vol 122-123 ◽  
pp. 368-370 ◽  
Author(s):  
S.J. Jiao ◽  
Y.M. Lu ◽  
D.Z. Shen ◽  
Z.Z. Zhang ◽  
B.H. Li ◽  
...  

Materials ◽  
2019 ◽  
Vol 12 (18) ◽  
pp. 3038 ◽  
Author(s):  
Ørnulf Nordseth ◽  
Raj Kumar ◽  
Kristin Bergum ◽  
Irinela Chilibon ◽  
Sean Erik Foss ◽  
...  

Cuprous oxide (Cu2O) is a p-type semiconductor with high optical absorption and a direct bandgap of about 2.1 eV, making it an attractive material for photovoltaic applications. For a high-performance photovoltaic device, the formation of low-resistivity contacts on Cu2O thin films is a prerequisite, which can be achieved by, for instance, nitrogen doping of Cu2O in order to increase the carrier concentration. In this work, nitrogen-doped p-type Cu2O thin films were prepared on quartz substrates by magnetron sputter deposition. By adding N2 gas during the deposition process, a nitrogen concentration of up to 2.3 × 1021 atoms/cm3 in the Cu2O thin films was achieved, as determined from secondary ion mass spectroscopy measurements. The effect of nitrogen doping on the structural, optical, and electrical properties of the Cu2O thin films was investigated. X-ray diffraction measurements suggest a preservation of the Cu2O phase for the nitrogen doped thin films, whereas spectrophotometric measurements show that the optical properties were not significantly altered by incorporation of nitrogen into the Cu2O matrix. A significant conductivity enhancement was achieved for the nitrogen-doped Cu2O thin films, based on Hall effect measurements, i.e., the hole concentration was increased from 4 × 1015 to 3 × 1019 cm−3 and the resistivity was reduced from 190 to 1.9 Ω⋅cm by adding nitrogen to the Cu2O thin films.


1994 ◽  
Vol 340 ◽  
Author(s):  
T. Cloitre ◽  
O. Briot ◽  
N. Briot ◽  
B. Gil ◽  
R.L. Aulombard

ABSTRACTWe designed a plasma cell for nitrogen doping of ZnSe, using a metal organic vapour phase epitaxy (MOVPE) horizontal reactor. With the following growth conditions: Tg=300°C, P=1 Torr and a molar VI/II ratio of 5, successful p-type doping was obtained, as assessed by photoluminescence experiments, but with a free carrier concentration still too low to be detected by transport measurements. The passivation of nitrogen active species by hydrogen is discussed. The possible interaction with the carrier gas has been studied through the use of H2, N2 and He as carrier gases. We demonstrate that the use of helium as carrier gas leads to sensible improvement of the photoluminescence features related to nitrogen acceptor. On the other hand, the use of N2 as carrier gas leads to poor homogeneity of the layers with few effects on the doping level.


2015 ◽  
Vol 821-823 ◽  
pp. 456-459 ◽  
Author(s):  
Takuma Kobayashi ◽  
Jun Suda ◽  
Tsunenobu Kimoto

It was discovered that the oxidation rate for SiC depended on the conduction type. The oxidation was performed for SiC(0001) with nitrogen doping (n-type) in the range from 2×1016cm-3to 1×1019cm-3, and aluminum doping (p-type) in the range from 2×1015cm-3to 1×1019cm-3, exhibiting a clear dependence. For n-type SiC the oxide thickness increases for higher doping density, and for p-type the thickness decreases. Note that in the case of Si oxidation, there exists very little difference of oxidation rate between the conduction types in such low doping density, and the dependence is peculiar to SiC.


1991 ◽  
Vol 222 ◽  
Author(s):  
Babar A. Khan ◽  
Nikhil Taskar ◽  
Donald Dorman ◽  
Khalid Shahzad

ABSTRACTWe have obtained p-type zinc selenide films by nitrogen doping combined with a post growth anneal. These films were grown on <100> gallium arsenide substrates using a low-pressure MOCVD process. Ammonia gas was used as the source for nitrogen. The as-grown films were annealed and then studied by photoluminescence (PL) and capacitance-voltage (CV) techniques. The PL data is dominated by the acceptor-bound exciton peak and donor-acceptor pair spectrum associated with the nitrogen acceptor. The C-V data shows that the films are p-type, with the highest measured net acceptor concentration of 3×1016/cm3.


2004 ◽  
Author(s):  
Jean-Francois Rommeluere ◽  
L. Svob ◽  
J. Mimila-Arroyo ◽  
S. A. S. Hassani ◽  
F. Jomard ◽  
...  

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