Structure of latent tracks in rutile single crystal of titanium dioxide induced by swift heavy ions

2006 ◽  
Vol 100 (4) ◽  
pp. 044308 ◽  
Author(s):  
Koichi Awazu ◽  
Xiaomin Wang ◽  
Makoto Fujimaki ◽  
Tetsuo Komatsubara ◽  
Takahiro Ikeda ◽  
...  
2017 ◽  
Vol 85 (1) ◽  
pp. 47-54
Author(s):  
V.A. Skuratov ◽  
◽  
M.M. Saifulin ◽  
G.M. Aralbayeva ◽  
J.H. O’Connell ◽  
...  

2011 ◽  
Author(s):  
Vincent Crasta ◽  
V. Ravindrachary ◽  
P. C. Rajesh Kumar ◽  
S. Ganesh ◽  
Alka B. Garg ◽  
...  

2005 ◽  
Vol 40 (2-6) ◽  
pp. 722-729 ◽  
Author(s):  
Koichi Awazu ◽  
Makoto Fujimaki ◽  
Yoshimichi Ohki ◽  
Tetsuro Komatsubara

2017 ◽  
Vol 85 (1) ◽  
pp. 47-54
Author(s):  
V.A. Skuratov ◽  
◽  
M.M. Saifulin ◽  
G.M. Aralbayeva ◽  
J.H. O’Connell ◽  
...  

2016 ◽  
Vol 18 (5) ◽  
pp. 3618-3627 ◽  
Author(s):  
Subodh K. Gautam ◽  
Arkaprava Das ◽  
S. Ojha ◽  
D. K. Shukla ◽  
D. M. Phase ◽  
...  

The electronic structure and tuning of work function (WF) by electronic excitations (EEs) induced by swift heavy ions (SHIs) in anatase niobium-doped titanium dioxide (NTO) thin films is reported.


2021 ◽  
Vol 4 (1) ◽  
Author(s):  
Miguel C. Sequeira ◽  
Jean-Gabriel Mattei ◽  
Henrique Vazquez ◽  
Flyura Djurabekova ◽  
Kai Nordlund ◽  
...  

AbstractGaN is the most promising upgrade to the traditional Si-based radiation-hard technologies. However, the underlying mechanisms driving its resistance are unclear, especially for strongly ionising radiation. Here, we use swift heavy ions to show that a strong recrystallisation effect induced by the ions is the key mechanism behind the observed resistance. We use atomistic simulations to examine and predict the damage evolution. These show that the recrystallisation lowers the expected damage levels significantly and has strong implications when studying high fluences for which numerous overlaps occur. Moreover, the simulations reveal structures such as point and extended defects, density gradients and voids with excellent agreement between simulation and experiment. We expect that the developed modelling scheme will contribute to improving the design and test of future radiation-resistant GaN-based devices.


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