Theoretical and experimental studies for nano-oxidation of silicon wafer by ac atomic force microscopy

2006 ◽  
Vol 99 (5) ◽  
pp. 054312 ◽  
Author(s):  
Jen Fin Lin ◽  
Chih Kuang Tai ◽  
Shuan Li Lin
Keyword(s):  
Atomic Force Microscopy ◽  
Silicon Wafer ◽  
Experimental Studies ◽  
Force Microscopy ◽  
Atomic Force

AFM Methodology for the Measurement of Silicon Wafer Microroughness

1996 ◽  
Vol 440 ◽  
Author(s):  
A.G. Gilicinski ◽  
S.E. Beck ◽  
R.M. Rynders ◽  
D.A. Moniot
Keyword(s):  
Atomic Force Microscopy ◽  
Spectral Density ◽  
Silicon Wafer ◽  
Power Spectral Density ◽  
Cutoff Frequency ◽  
Force Microscopy ◽  
Atomic Force ◽  
Experimental Solution ◽  
Power Spectral ◽  
Afm Probe

AbstractDespite the growing use of atomic force microscopy (AFM) for the measurement of silicon wafer microroughness, no generally accepted method has been developed to deal with issues around accuracy and reproducibility. We review problems that affect these AFM studies and demonstrate the effect of probe tip size on AFM microroughness data. Without knowledge of AFM probe tip geometry, it is impossible to quantitatively compare Ra or RMS microroughness data between different measurements. An experimental solution is to characterize tip sizes during imaging and compare data taken with similar size tips. While this will significantly improve quantitation, it is restrictive in that data taken with different size tips cannot be easily compared. We propose a solution to this problem in the use of power spectral density (PSD) to evaluate microroughness with a “cutoff frequency” at the lateral wavelength where tip effects begin to affect the accuracy of the microroughness measurement. An example of this approach is described

scholarly journals Annealing study of two-dimensional patterned Ge nanostructures via nanosphere lithography

Open Physics ◽  
2011 ◽  
Vol 9 (5) ◽  
Author(s):  
Magdalena Ulmeanu ◽  
Iuliana Iordache ◽  
Mihaela Filipescu ◽  
Valentin Craciun ◽  
Simona Pinzaru ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Colloidal Particles ◽  
Experimental Studies ◽  
Annealing Process ◽  
Polystyrene Spheres ◽  
Lateral Dimension ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Annealing Study

AbstractExperimental studies on patterning hexagonal Ge nanostructures have been conducted on Si substrates through deposition of Ge with colloidal particles as a mask. The deposited Ge thin film possesses, according to the X-ray diffraction measurements, in plane texture, being epitaxial and aligned with the (111) Si substrate. The size distribution of the patterned Ge nanostructures is narrow, as indicated by the atomic force microscopy and scanning electron microscopy measurements. We have obtained Ge nanostructures with lateral dimension of 490 nm (height 12 nm), 200 nm (height 6 nm) and 82 nm (height 6 nm) by using different sizes of polystyrene spheres. We have performed in depth studies of the Ge nanostructures’ behavior due to thermal and rapid thermal post-annealing processes. FT micro-Raman spectroscopy shows that there is no Si intermixing during the annealing process. In order to quantify the changes in the height and lateral dimension, we have performed atomic force microscopy and white light interferometry analysis. The changes in shape and the decrease in the area of a cross-section of Ge nanostructure will be discussed in respect to similar results shown in the literature for Ge thin films during the annealing process.

CHARACTERIZATION OF SILICON WAFER SURFACES AFTER HYDROPHILIC AND HYDROPHOBIC TREATMENTS BY ATOMIC FORCE MICROSCOPY

2010 ◽  
Author(s):  
Xiaoning Xi ◽  
Jinjie Shi ◽  
Sahar Maghsoudy-Louyeh ◽  
Bernhard R. Tittmann ◽  
Donald O. Thompson ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Silicon Wafer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Wafer Surfaces

Atomic Force Microscopy (AFM) for Rubber

2008 ◽  
Vol 81 (3) ◽  
pp. 359-383 ◽  
Author(s):  
Lili L. Johnson
Keyword(s):  
Atomic Force Microscopy ◽  
Crosslink Density ◽  
Experimental Studies ◽  
Surface Force ◽  
Experimental Investigations ◽  
Practical Applications ◽  
Force Microscopy ◽  
Atomic Force ◽  
Linear Correction ◽  
Resolution Imaging

Abstract In this review, first, the development of atomic force microscopy as an imaging technique, as a surface force apparatus, and as a nanoindenter was illustrated using experimental studies. The experimental analysis of atomic force microscopy emphasizes the empirical methods of achieving high resolution imaging through controlled forces between tip and sample interactions. Second, mapping mechanical properties on nanometer scale by atomic force microscopy is presented with both experimental investigations and selection of elastic models. Elastomer crosslink density was mapped using atomic force microscopy combined with elastic theories. The force — penetration depth investigation of crosslink density for elastomer by AFM shows linear correction with both experimental studies using Dynamic Mechanical Thermal Analysis (DMTA) and classic swelling method and calculation using statistical rubber elasticity theory. Last, the focus is on the understanding of atomic force microscopy for practical applications. Filler dispersion and blends structure are demonstrated for automotive applications. Micro phase separation was intensely studied for film industries. Morphology of composites is investigated for the applications of tire, automotive and foaming industries.

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