Thermal and optical properties of bulk GaN crystals fabricated through hydride vapor phase epitaxy with void-assisted separation

2005 ◽  
Vol 98 (10) ◽  
pp. 103509 ◽  
Author(s):  
Yuichi Oshima ◽  
Takayuki Suzuki ◽  
Takeshi Eri ◽  
Yusuke Kawaguchi ◽  
Kazutoshi Watanabe ◽  
...  
Author(s):  
Gabin Grégoire ◽  
Mohammed Zeghouane ◽  
Curtis Goosney ◽  
Nebile Isik Goktas ◽  
Philipp Staudinger ◽  
...  

Author(s):  
S Gradecak ◽  
M Albrecht ◽  
H P Strunk ◽  
D Martin ◽  
J Napierala ◽  
...  

2017 ◽  
Vol 122 (20) ◽  
pp. 205302 ◽  
Author(s):  
Shaoteng Wu ◽  
Liancheng Wang ◽  
Xiaoyan Yi ◽  
Zhiqiang Liu ◽  
Tongbo Wei ◽  
...  

1997 ◽  
Vol 482 ◽  
Author(s):  
A. Usui

AbstractA new approach to grow thick GaN layers by hydride vapor phase epitaxy (HVPE) is described. Selective growth is carried out at the beginning of growth. The coalescence of selectively grown facet structures makes it possible to achieve a flat surface over the entire substrate. As a result, crack-free GaN films with mirror-like surfaces are successfully grown even to a thickness of about 100 μm on a 2-inch-diameter sapphire substrate. The extended defect density is as low as 6×107 cm−2. The reduction mechanism for dislocation is discussed based on TEM observation. The high optical properties of FIELO GaN are confirmed by 5 K photoluminescence and reflectance measurements.


2020 ◽  
Vol 29 (2) ◽  
pp. 026104 ◽  
Author(s):  
Yu-Min Zhang ◽  
Jian-Feng Wang ◽  
De-Min Cai ◽  
Guo-Qiang Ren ◽  
Yu Xu ◽  
...  

2010 ◽  
Vol 312 (24) ◽  
pp. 3569-3573 ◽  
Author(s):  
Yuichi Oshima ◽  
Takehiro Yoshida ◽  
Kazutoshi Watanabe ◽  
Tomoyoshi Mishima

2008 ◽  
Vol 47 (5) ◽  
pp. 3346-3349 ◽  
Author(s):  
Tongbo Wei ◽  
Ruifei Duan ◽  
Junxi Wang ◽  
Jinmin Li ◽  
Ziqiang Huo ◽  
...  

2006 ◽  
Vol 99 (11) ◽  
pp. 116103 ◽  
Author(s):  
D. Y. Song ◽  
V. Kuryatkov ◽  
M. Basavaraj ◽  
D. Rosenbladt ◽  
S. A. Nikishin ◽  
...  

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