Growth kinetics of TiO2 films deposited by aerosol-assisted chemical-vapor deposition from two different precursors (Ti-n-butoxide and Ti diisopropoxide)

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Vol 98 (5) ◽  
pp. 054908 ◽  
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N. Castillo ◽  
M. Guerrero
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Growth Kinetics ◽  
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Chemical Vapor ◽  
Tio2 Films ◽  
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scholarly journals Study of deposition parameters and growth kinetics of ZnO deposited by aerosol assisted chemical vapor deposition

RSC Advances ◽  
2021 ◽  
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S. M. Olaizola ◽  
E. Castaño ◽  
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Vapor Deposition ◽  
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Impact of deposition parameters, microstructure and growth kinetics analysis of ZnO grown by Aerosol-assisted Chemical Vapor Deposition (AACVD).

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Author(s):  
Brian G. Anthony ◽  
Ting-Chen Hsu ◽  
Louis H. Breaux ◽  
Rong Z. Qian ◽  
Sanjay K. Banerjee ◽  
...  
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Chemical Vapor Deposition ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Low Temperatures ◽  
Experimental Studies ◽  
Chemical Vapor ◽  
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Systematic investigation of the growth kinetics of β-Ga2O3 epilayer by plasma enhanced chemical vapor deposition

2020 ◽  
Vol 116 (7) ◽  
pp. 072102 ◽  
Author(s):  
C. Wu ◽  
D. Y. Guo ◽  
L. Y. Zhang ◽  
P. G. Li ◽  
F. B. Zhang ◽  
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Chemical Vapor Deposition ◽  
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Chemical Vapor ◽  
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