Fabrication of large area two- and three-dimensional polymer photonic crystals using single refracting prism holographic lithography

2005 ◽  
Vol 86 (24) ◽  
pp. 241102 ◽  
Author(s):  
Lijun Wu ◽  
Yongchun Zhong ◽  
Che Ting Chan ◽  
Kam Sing Wong ◽  
Guo Ping Wang
Keyword(s):  
Photonic Crystals ◽  
Three Dimensional ◽  
Holographic Lithography ◽  
Large Area

scholarly journals Three-dimensional photonic crystals by large-area membrane stacking

2012 ◽  
Vol 37 (22) ◽  
pp. 4726 ◽  
Author(s):  
Ling Lu ◽  
Lin Lee Cheong ◽  
Henry I. Smith ◽  
Steven G. Johnson ◽  
John D. Joannopoulos ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Three Dimensional ◽  
Large Area

Design of three-dimensional photonic crystals for large-area membrane stacking

2012 ◽  
Author(s):  
Ling Lu ◽  
Lin Lee Cheong ◽  
Henry I. Smith ◽  
Steven G. Johnson ◽  
John Joannopoulos ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Three Dimensional ◽  
Large Area

Three-dimensional photonic crystals fabricated by visible light holographic lithography

2003 ◽  
Vol 82 (14) ◽  
pp. 2212-2214 ◽  
Author(s):  
X. Wang ◽  
J. F. Xu ◽  
H. M. Su ◽  
Z. H. Zeng ◽  
Y. L. Chen ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Visible Light ◽  
Three Dimensional ◽  
Holographic Lithography

Thermoresponsive Hydrogel Photonic Crystals by Three-Dimensional Holographic Lithography

2008 ◽  
Vol 20 (16) ◽  
pp. 3061-3065 ◽  
Author(s):  
Ji-Hwan Kang ◽  
Jun Hyuk Moon ◽  
Seung-Kon Lee ◽  
Sung-Gyu Park ◽  
Se Gyu Jang ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Three Dimensional ◽  
Holographic Lithography ◽  
Thermoresponsive Hydrogel

Fabrication of Photonic Crystals by Holographic Lithography Method

2007 ◽  
Vol 31 ◽  
pp. 98-100
Author(s):  
Jong Bin Yeo ◽  
Hyun Yong Lee
Keyword(s):  
Photonic Crystals ◽  
Incident Angle ◽  
Process Condition ◽  
Monomethyl Ether ◽  
Structure Design ◽  
Holographic Lithography ◽  
Large Area ◽  
Periodic Patterns ◽  
Nano Structure ◽  
Set Up

In this study, we found out the new fabrication process condition for Photonic crystals(PCs). PCs were fabricated by holographic lithography(HL), instead of commonly used electron beam lithography(EBL). HL process enable periodic large area fabrication of PCs. Also this method can easily control the pitch of periodic patterns. We set up holographic lithography system by laser and some optical components. The source of light used laser of 442 nm wavelength. Photo-resist(PR) used DMI-150 model. The viscosity of PR is diluted with propylene glycol monomethyl ether acetate(PGMEA) which is solvent for DMI-150. This experiment is holographic lithography of rotated double exposure method for PCs pattern. The method use only one beam. Result data is shown by atomic force microscope(AFM), scanning electron microscope(SEM) and 3D contour image. At the this study, we conclude conditions which we need periodic structure for PCs. It is some factor. For example, incident angle, exposure time, rotation angle, etc. And we show incident angle calculation recipe for needed size of periodic patterns. We already manufacture PCs structure design and simulation tool. Nano structure of this paper’s result is applied to designed PCs patterns.

Photonic Crystals Made by Holographic Lithography

MRS Bulletin ◽  
2001 ◽  
Vol 26 (8) ◽  
pp. 632-636 ◽  
Author(s):  
A.J. Turberfield
Keyword(s):  
Photonic Crystals ◽  
Dielectric Material ◽  
Three Dimensional ◽  
Initial Step ◽  
Refractive Indices ◽  
Holographic Lithography ◽  
Coherent Light ◽  
Interpenetrating Networks ◽  
Optical Wavelength ◽  
3D Microstructure

A photonic crystal is a periodically structured composite material, with a unit cell whose dimensions are of the order of an optical wavelength, made from constituents whose refractive indices differ greatly (Δn is of the order of 2). Three-dimensional (3D) photonic crystals typically consist of interpenetrating networks of dielectric material and air. Holographic lithography is a technology for the fabrication of photonic crystals in which the initial step is to define the 3D microstructure by interference of coherent light in a photosensitive precursor.

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