Reply to “Comment on ‘Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water” ’ [J. Appl. Phys. 95, 4777 (2004)]

2005 ◽  
Vol 98 (1) ◽  
pp. 016102 ◽  
Author(s):  
Riikka L. Puurunen
2005 ◽  
Vol 15 (4) ◽  
pp. 275-280
Author(s):  
Hie-Chul Kim ◽  
Min-Wan Kim ◽  
Hyung-Su Kim ◽  
Hyug-Jong Kim ◽  
Woo-Keun Sohn ◽  
...  

2002 ◽  
Vol 92 (10) ◽  
pp. 5698-5703 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Jonas Sundqvist ◽  
Jaan Aarik ◽  
Jun Lu ◽  
...  

2018 ◽  
Vol 6 (30) ◽  
pp. 8051-8059 ◽  
Author(s):  
Ermioni Polydorou ◽  
Martha Botzakaki ◽  
Charalampos Drivas ◽  
Kostas Seintis ◽  
Ilias Sakellis ◽  
...  

Atomic layer deposition of HfO2 significantly increases the efficiency and prolongs the lifetime of organic solar cells.


2004 ◽  
Vol 96 (9) ◽  
pp. 5298-5307 ◽  
Author(s):  
Kaupo Kukli ◽  
Jaan Aarik ◽  
Mikko Ritala ◽  
Teet Uustare ◽  
Timo Sajavaara ◽  
...  

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