Reply to “Comment on ‘Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water” ’ [J. Appl. Phys. 95, 4777 (2004)]
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2018 ◽
Vol 6
(30)
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pp. 8051-8059
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2019 ◽
Vol 28
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pp. 084005
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2004 ◽
Vol 22
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pp. 2035-2040
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