Investigation of Mg doping in high-Al content p-type AlxGa1−xN (0.3

2005 ◽  
Vol 86 (8) ◽  
pp. 082107 ◽  
Author(s):  
S.-R. Jeon ◽  
Z. Ren ◽  
G. Cui ◽  
J. Su ◽  
M. Gherasimova ◽  
...  
Keyword(s):  
P Type ◽  
1996 ◽  
Vol 423 ◽  
Author(s):  
J. Bernholc ◽  
P. Boguslawski ◽  
E. L. Briggs ◽  
M. Buongiorno Nardelli ◽  
B. Chen ◽  
...  

AbstractThe results of extensive theoretical studies of group IV impurities and surface and interface properties of nitrides are presented and compared with available experimental data. Among the impurities, we have considered substitutional C, Si, and Ge. CN is a very shallow acceptor, and thus a promising p-type dopant. Both Si and Ge are excellent donors in GaN. However, in AlGaN alloys the DX configurations are stable for a sufficiently high Al content, which quenches the doping efficiency. At high concentrations, it is energetically favorable for group IV impurities to form nearest-neighbor Xcation-XN pairs. Turning to surfaces, AIN is known to exhibit NEA. We find that the NEA property depends sensitively on surface reconstruction and termination. At interfaces, the strain effects on the band offsets range from 20% to 40%, depending on the substrate. The AIN/GaN/InN interfaces are all of type I, while the A10.5Ga0.5 N/A1N zinc-blende (001) interface may be of type II. Further, the calculated bulk polarizations in wurtzite AIN and GaN are -1.2 and -0.45 μC/cm2, respectively, and the interface contribution to the polarization in the GaN/AlN wurtzite multi-quantum-well is small.


2004 ◽  
Vol 201 (12) ◽  
pp. 2803-2807 ◽  
Author(s):  
Toshiyuki Obata ◽  
Hideki Hirayama ◽  
Yoshinobu Aoyagi ◽  
Koji Ishibashi

2013 ◽  
Vol 102 (1) ◽  
pp. 012105 ◽  
Author(s):  
Toru Kinoshita ◽  
Toshiyuki Obata ◽  
Hiroyuki Yanagi ◽  
Shin-ichiro Inoue

2014 ◽  
Vol 116 (4) ◽  
pp. 044306 ◽  
Author(s):  
Yuting Peng ◽  
Congxin Xia ◽  
Heng Zhang ◽  
Tianxing Wang ◽  
Shuyi Wei ◽  
...  

2007 ◽  
Vol 1040 ◽  
Author(s):  
Enno Malguth ◽  
Axel Hoffmann ◽  
Wolfgang Gehlhoff ◽  
Matthew H. Kane ◽  
Ian T. Ferguson

AbstractIn the context of the pursuit of a dilute magnetic semiconductor for spintronic applications, a set of GaMnN samples with varying Mn concentration and Si or Mg co-doping was investigated by optical and electron spin resonance spectroscopy. The results clearly demonstrate how the charge state of Mn is changed between 2+, 3+ and 4+ by Mg and Si co-doping. For p-type GaMnN we show that the introduction of the Mn3+/4+ donor can be compensated by Mg co-doping lowering the Fermi energy below the Mn3+/4+ level. While our results are in agreement with the hypothesis that the infrared photoluminescence appearing in GaMnN upon Mg doping originates from Mn4+, an unambiguous proof is still to be presented. Under this assumption, our measurements show that the Mn4+ center must be excited via an extra-center process at 2.54 eV.


1975 ◽  
Vol 27 (1) ◽  
pp. 111-121 ◽  
Author(s):  
A. Schauer ◽  
M. Roschy ◽  
W. Juergens

Materials ◽  
2021 ◽  
Vol 14 (18) ◽  
pp. 5339
Author(s):  
Lian Zhang ◽  
Rong Wang ◽  
Zhe Liu ◽  
Zhe Cheng ◽  
Xiaodong Tong ◽  
...  

This work studied the regulation of hole concentration and mobility in p-InGaN layers grown by metalorganic chemical vapor deposition (MOCVD) under an N-rich environment. By adjusting the growth temperature, the hole concentration can be controlled between 6 × 1017/cm3 and 3 × 1019/cm3 with adjustable hole mobility from 3 to 16 cm2/V.s. These p-InGaN layers can meet different requirements of devices for hole concentration and mobility. First-principles defect calculations indicate that the p-type doping of InGaN at the N-rich limiting condition mainly originated from Mg substituting In (MgIn). In contrast with the compensation of nitrogen vacancy in p-type InGaN grown in a Ga-rich environment, the holes in p-type InGaN grown in an N-rich environment were mainly compensated by interstitial Mg (Mgi), which has very low formation energy.


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