Vapor deposition of strongly bonded hydrocarbon films on diamondlike carbon surfaces

2005 ◽  
Vol 97 (10) ◽  
pp. 10P307 ◽  
Author(s):  
Junho Choi ◽  
Takahisa Kato ◽  
Masami Ikeyama
1993 ◽  
Vol 334 ◽  
Author(s):  
I.B. Graff ◽  
R.A. Pugliese ◽  
P.R. Westmoreland

AbstractMolecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.


2010 ◽  
Vol 108 (11) ◽  
pp. 114915 ◽  
Author(s):  
A. Riedo ◽  
P. Wahlström ◽  
J. A. Scheer ◽  
P. Wurz ◽  
M. Tulej

2009 ◽  
Vol 27 (5) ◽  
pp. 1188-1195 ◽  
Author(s):  
Patrick P. Hughes ◽  
Michael A. Coplan ◽  
Jeffery N. DeFazio ◽  
Dennis J. Chornay ◽  
Michael R. Collier ◽  
...  

1995 ◽  
Vol 66 (23) ◽  
pp. 3152-3154 ◽  
Author(s):  
R. C. Cheshire ◽  
W. G. Graham ◽  
T. Morrow ◽  
V. Kornas ◽  
H. F. Döbele ◽  
...  

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