Modeling of microcrystalline silicon film deposition in a capacitively coupled radio-frequency plasma reactor

Koji Satake; Yasuyuki Kobayashi

doi:10.1063/1.1821639

Modeling of microcrystalline silicon film deposition in a capacitively coupled radio-frequency plasma reactor

Journal of Applied Physics ◽

10.1063/1.1821639 ◽

2005 ◽

Vol 97 (2) ◽

pp. 023308 ◽

Cited By ~ 9

Author(s):

Koji Satake ◽

Yasuyuki Kobayashi

Keyword(s):

Radio Frequency ◽

Plasma Reactor ◽

Silicon Film ◽

Film Deposition ◽

Radio Frequency Plasma ◽

Microcrystalline Silicon ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Microcrystalline Silicon Film

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Design and operation of a rotating drum radio frequency plasma reactor for the modification of free nanoparticles

Review of Scientific Instruments ◽

10.1063/1.4811138 ◽

2013 ◽

Vol 84 (6) ◽

pp. 063904 ◽

Cited By ~ 7

Author(s):

Jeffrey C. Shearer ◽

Ellen R. Fisher

Keyword(s):

Radio Frequency ◽

Plasma Reactor ◽

Radio Frequency Plasma ◽

Rotating Drum ◽

Frequency Plasma

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Influence of finite geometrical asymmetry of the electrodes in capacitively coupled radio frequency plasma

Physics of Plasmas ◽

10.1063/1.4893148 ◽

2014 ◽

Vol 21 (8) ◽

pp. 083509 ◽

Cited By ~ 15

Author(s):

B. Bora ◽

L. Soto

Keyword(s):

Radio Frequency ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma

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Observations of Electron Energy Distribution Functions and Ion Bombardment Secondary Electrons in a Capacitively Coupled Radio Frequency Plasma

IEEJ Transactions on Fundamentals and Materials ◽

10.1541/ieejfms1990.119.6_866 ◽

1999 ◽

Vol 119 (6) ◽

pp. 866-871 ◽

Cited By ~ 1

Author(s):

Yasunori Ohtsu ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Radio Frequency ◽

Electron Energy ◽

Distribution Functions ◽

Radio Frequency Plasma ◽

Electron Energy Distribution ◽

Secondary Electrons ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Energy Distribution Functions

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Numerical modeling of dust particle configurations in a cylindrical radio-frequency plasma reactor

Physical Review E ◽

10.1103/physreve.76.056405 ◽

2007 ◽

Vol 76 (5) ◽

Cited By ~ 8

Author(s):

M. Davoudabadi ◽

F. Mashayek

Keyword(s):

Numerical Modeling ◽

Radio Frequency ◽

Dust Particle ◽

Plasma Reactor ◽

Radio Frequency Plasma ◽

Frequency Plasma

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On the role of secondary electron emission in capacitively coupled radio‐frequency plasma sheath: A theoretical ground

Plasma Processes and Polymers ◽

10.1002/ppap.201900093 ◽

2019 ◽

Vol 16 (11) ◽

pp. 1900093 ◽

Cited By ~ 2

Author(s):

Guang‐Yu Sun ◽

Han‐Wei Li ◽

An‐Bang Sun ◽

Yuan Li ◽

Bai‐Peng Song ◽

...

Keyword(s):

Radio Frequency ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Plasma Sheath ◽

Theoretical Ground ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma

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Development, diagnostic and applications of radio-frequency plasma reactor

Journal of Physics Conference Series ◽

10.1088/1742-6596/133/1/012007 ◽

2008 ◽

Vol 133 ◽

pp. 012007 ◽

Cited By ~ 2

Author(s):

N Puač

Keyword(s):

Radio Frequency ◽

Plasma Reactor ◽

Radio Frequency Plasma ◽

Frequency Plasma

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Effects of radio-frequency plasma on structure and properties in Ti film deposition by dc and pulsed dc magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.03.055 ◽

2009 ◽

Vol 517 (20) ◽

pp. 5837-5843 ◽

Cited By ~ 18

Author(s):

Toshiyuki Oya ◽

Eiji Kusano

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Film Deposition ◽

Radio Frequency Plasma ◽

Structure And Properties ◽

Dc Magnetron Sputtering ◽

Pulsed Dc ◽

Frequency Plasma ◽

Pulsed Dc Magnetron Sputtering

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Corrigendum: Studies on the effect of finite geometrical asymmetry in dual capacitively coupled radio frequency plasma (2015 Plasma Sources Sci. Technol. 24 054002)

Plasma Sources Science and Technology ◽

10.1088/0963-0252/24/6/069501 ◽

2015 ◽

Vol 24 (6) ◽

pp. 069501

Author(s):

B Bora

Keyword(s):

Radio Frequency ◽

Radio Frequency Plasma ◽

Plasma Sources ◽

Capacitively Coupled ◽

Frequency Plasma

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A comparative investigation of some analytical performance characteristics of an inductively-coupled radio frequency plasma and a capacitively-coupled microwave plasma for solution analysis by emission spectrometry

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(75)80040-1 ◽

1975 ◽

Vol 30 (10-11) ◽

pp. 449-469 ◽

Cited By ~ 70

Author(s):

P.W.J.M. Boumans ◽

F.J. de Boer ◽

F.J. Dahmen ◽

H. Hoelzel ◽

A. Meier

Keyword(s):

Radio Frequency ◽

Microwave Plasma ◽

Comparative Investigation ◽

Performance Characteristics ◽

Analytical Performance ◽

Emission Spectrometry ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Inductively Coupled ◽

Frequency Plasma

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Hydrophobic over-recovery during aging of polyethylene modified by oxygen capacitively coupled radio frequency plasma: A new approach for stable superhydrophobic surface with high water adhesion

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.05.120 ◽

2012 ◽

Vol 206 (23) ◽

pp. 4952-4958 ◽

Cited By ~ 20

Author(s):

Y.P. Li ◽

S.Y. Li ◽

W. Shi ◽

M.K. Lei

Keyword(s):

Radio Frequency ◽

Superhydrophobic Surface ◽

High Water ◽

Radio Frequency Plasma ◽

New Approach ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Water Adhesion

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