Metal delocalization and surface decoration in direct-write nanolithography by electron beam induced deposition

2004 ◽  
Vol 85 (1) ◽  
pp. 49-51 ◽  
Author(s):  
Vidyut Gopal ◽  
Eric A. Stach ◽  
Velimir R. Radmilovic ◽  
Ian A. Mowat
Keyword(s):  
Electron Beam ◽  
Direct Write ◽  
Surface Decoration ◽  
Electron Beam Induced Deposition

scholarly journals Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

2018 ◽  
Vol 9 ◽  
pp. 2581-2598 ◽  
Author(s):  
Lukas Keller ◽  
Michael Huth
Keyword(s):  
Electron Beam ◽  
3D Structure ◽  
Three Dimensional ◽  
Pattern Generation ◽  
Proximity Effects ◽  
Writing Strategies ◽  
Direct Write ◽  
Nanoscale Structures ◽  
Geometrical Description ◽  
Electron Beam Induced Deposition

Fabrication of three-dimensional (3D) nanoarchitectures by focused electron beam induced deposition (FEBID) has matured to a level that highly complex and functional deposits are becoming available for nanomagnetics and plasmonics. However, the generation of suitable pattern files that control the electron beam’s movement, and thereby reliably map the desired target 3D structure from a purely geometrical description to a shape-conforming 3D deposit, is nontrivial. To address this issue we developed several writing strategies and associated algorithms implemented in C++. Our pattern file generator handles different proximity effects and corrects for height-dependent precursor coverage. Several examples of successful 3D nanoarchitectures using different precursors are presented that validate the effectiveness of the implementation.

scholarly journals Low-dose patterning of platinum nanoclusters on carbon nanotubes by focused-electron-beam-induced deposition as studied by TEM

2013 ◽  
Vol 4 ◽  
pp. 77-86 ◽  
Author(s):  
Xiaoxing Ke ◽  
Carla Bittencourt ◽  
Sara Bals ◽  
Gustaaf Van Tendeloo
Keyword(s):  
Carbon Nanotubes ◽  
Electron Beam ◽  
Low Dose ◽  
Direct Write ◽  
Pt Nanoclusters ◽  
Transmission Electron ◽  
High Resolution Tem ◽  
Physical Deposition ◽  
Electron Beam Induced Deposition ◽  
Beam Parameters

Focused-electron-beam-induced deposition (FEBID) is used as a direct-write approach to decorate ultrasmall Pt nanoclusters on carbon nanotubes at selected sites in a straightforward maskless manner. The as-deposited nanostructures are studied by transmission electron microscopy (TEM) in 2D and 3D, demonstrating that the Pt nanoclusters are well-dispersed, covering the selected areas of the CNT surface completely. The ability of FEBID to graft nanoclusters on multiple sides, through an electron-transparent target within one step, is unique as a physical deposition method. Using high-resolution TEM we have shown that the CNT structure can be well preserved thanks to the low dose used in FEBID. By tuning the electron-beam parameters, the density and distribution of the nanoclusters can be controlled. The purity of as-deposited nanoclusters can be improved by low-energy electron irradiation at room temperature.

scholarly journals Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material

Micromachines ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 8
Author(s):  
Sangeetha Hari ◽  
P. H. F. Trompenaars ◽  
J. J. L. Mulders ◽  
Pieter Kruit ◽  
C. W. Hagen
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Secondary Electron ◽  
Direct Write ◽  
Post Processing ◽  
Force Microscopy ◽  
Atomic Force ◽  
Backscattered Electron ◽  
Electron Beam Induced Deposition ◽  
Gaussian Line

High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile. We demonstrate the use of focused electron beam-induced etching (FEBIE) as a scanning electron microscope (SEM)-based direct-write technique for the removal of this interconnecting material, which can be implemented without removing the sample from the SEM for post processing. Secondary electron (SE) imaging has been used to monitor the FEBIE process, and atomic force microscopy (AFM) measurements confirm the fabrication of well separated FEBID lines. We further demonstrate the application of this technique for removing interconnecting material in high resolution dense lines using backscattered electron (BSE) imaging to monitor the process.

scholarly journals Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

2018 ◽  
Vol 9 ◽  
pp. 77-90 ◽  
Author(s):  
Ziyan Warneke ◽  
Markus Rohdenburg ◽  
Jonas Warneke ◽  
Janina Kopyra ◽  
Petra Swiderek
Keyword(s):  
Electron Beam ◽  
Direct Write ◽  
Reaction Products ◽  
Thermal Desorption Spectrometry ◽  
Thermal Chemistry ◽  
Volatile Products ◽  
Versatile Tool ◽  
Electron Beam Induced Deposition ◽  
Electron Stimulated Desorption ◽  
The Stability

Focused electron beam induced deposition (FEBID) is a versatile tool for the direct-write fabrication of nanostructures on surfaces. However, FEBID nanostructures are usually highly contaminated by carbon originating from the precursor used in the process. Recently, it was shown that platinum nanostructures produced by FEBID can be efficiently purified by electron irradiation in the presence of water. If such processes can be transferred to FEBID deposits produced from other carbon-containing precursors, a new general approach to the generation of pure metallic nanostructures could be implemented. Therefore this study aims to understand the chemical reactions that are fundamental to the water-assisted purification of platinum FEBID deposits generated from trimethyl(methylcyclopentadienyl)platinum(IV) (MeCpPtMe3). The experiments performed under ultrahigh vacuum conditions apply a combination of different desorption experiments coupled with mass spectrometry to analyse reaction products. Electron-stimulated desorption monitors species that leave the surface during electron exposure while post-irradiation thermal desorption spectrometry reveals products that evolve during subsequent thermal treatment. In addition, desorption of volatile products was also observed when a deposit produced by electron exposure was subsequently brought into contact with water. The results distinguish between contributions of thermal chemistry, direct chemistry between water and the deposit, and electron-induced reactions that all contribute to the purification process. We discuss reaction kinetics for the main volatile products CO and CH4 to obtain mechanistic information. The results provide novel insights into the chemistry that occurs during purification of FEBID nanostructures with implications also for the stability of the carbonaceous matrix of nanogranular FEBID materials under humid conditions.

Synthesis of Individually Tuned Nanomagnets for Nanomagnet Logic by Direct Write Focused Electron Beam Induced Deposition

ACS Nano ◽  
2012 ◽  
Vol 7 (1) ◽  
pp. 777-784 ◽  
Author(s):  
Marco Gavagnin ◽  
Heinz D. Wanzenboeck ◽  
Domagoj Belić ◽  
Emmerich Bertagnolli
Keyword(s):  
Electron Beam ◽  
Direct Write ◽  
Nanomagnet Logic ◽  
Electron Beam Induced Deposition

scholarly journals Direct-write single electron transistors by focused electron beam induced deposition

Nano Futures ◽  
2019 ◽  
Vol 3 (2) ◽  
pp. 025001 ◽  
Author(s):  
Giorgia Di Prima ◽  
Roland Sachser ◽  
Piet Trompenaars ◽  
Hans Mulders ◽  
Michael Huth
Keyword(s):  
Electron Beam ◽  
Single Electron ◽  
Direct Write ◽  
Single Electron Transistors ◽  
Electron Beam Induced Deposition ◽  
Electron Transistors

ELECTRON BEAM DIRECT WRITE EFFECTS ON CMOS DEVICES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-291-C4-294
Author(s):  
K. BARLOW
Keyword(s):  
Electron Beam ◽  
Direct Write
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