A phase-field approach to the simulation of the excimer laser annealing process in Si

2004 ◽  
Vol 95 (9) ◽  
pp. 4806-4814 ◽  
Author(s):  
Antonino La Magna ◽  
Paola Alippi ◽  
Vittorio Privitera ◽  
Guglielmo Fortunato ◽  
Marco Camalleri ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Phase Field ◽  
Laser Annealing ◽  
Annealing Process ◽  
Excimer Laser Annealing ◽  
Field Approach

Effects of Excimer Laser Annealing Process on the Ni-Sputtered Amorphous Silicon Film

2010 ◽  
Vol 13 (10) ◽  
pp. H346 ◽  
Author(s):  
Moojin Kim ◽  
GuangHai Jin ◽  
Hoonkee Min ◽  
HoKyoon Chung ◽  
Sangsoo Kim ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Excimer Laser ◽  
Laser Annealing ◽  
Silicon Film ◽  
Annealing Process ◽  
Excimer Laser Annealing ◽  
Amorphous Silicon Film

A Two-Pass Excimer Laser Annealing Process to Control Amorphous Silicon Crystallization

1999 ◽  
Vol 38 (Part 2, No. 8B) ◽  
pp. L907-L910 ◽  
Author(s):  
Luigi Mariucci ◽  
Roberto Carluccio ◽  
Alessandro Pecora ◽  
Vittorio Foglietti ◽  
Guglielmo Fortunato ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Excimer Laser ◽  
Laser Annealing ◽  
Annealing Process ◽  
Excimer Laser Annealing
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