Thermal energy electron attachment rate constants for some polyatomic molecules

1973 ◽  
Vol 59 (5) ◽  
pp. 2324-2329 ◽  
Author(s):  
F. J. Davis ◽  
R. N. Compton ◽  
D. R. Nelson
Keyword(s):  
Thermal Energy ◽  
Rate Constants ◽  
Electron Attachment ◽  
Polyatomic Molecules ◽  
Energy Electron ◽  
Attachment Rate

A new instrument for thermal electron attachment at high temperature: NF3 and CH3Cl attachment rate constants up to 1100 K

2009 ◽  
Vol 80 (3) ◽  
pp. 034104 ◽  
Author(s):  
Thomas M. Miller ◽  
Jeffrey F. Friedman ◽  
John S. Williamson ◽  
Linda C. Schaffer ◽  
A. A. Viggiano
Keyword(s):  
High Temperature ◽  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate ◽  
Thermal Electron ◽  
New Instrument

Electron attachment rate constants of SOCl2 in Ar, N2, and CH4

1986 ◽  
Vol 85 (11) ◽  
pp. 6470-6474 ◽  
Author(s):  
W. C. Wang ◽  
L. C. Lee
Keyword(s):  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate

Microwave Conductivity: A New Technique for Gas-Phase Pulse Radiolysis

1988 ◽  
Vol 41 (9) ◽  
pp. 1491 ◽  
Author(s):  
J Sherwell ◽  
R Cooper ◽  
DC Nguyen ◽  
SP Mezyk
Keyword(s):  
Gas Phase ◽  
Rate Constants ◽  
Recombination Rate ◽  
Pulse Radiolysis ◽  
Electron Attachment ◽  
New Technique ◽  
Attachment Rate ◽  
Thermal Electron ◽  
Ion Recombination ◽  
A New Technique

A new technique involving a combination of microwave absorption techniques and pulse radiolysis has been used to monitor electron processes in irradiated gases. The thermal electron attachment rate constants of various halogen-containing molecules have been measured and compared with the available literature values. The adaption of this technique for the measurement of electron-ion recombination rate constants and thermalization times for these gases is discussed.

Electron attachment to halomethanes at high temperature: CH2Cl2, CF2Cl2, CH3Cl, and CF3Cl attachment rate constants up to 1100 K

2009 ◽  
Vol 131 (8) ◽  
pp. 084302 ◽  
Author(s):  
Thomas M. Miller ◽  
Jeffrey F. Friedman ◽  
Linda C. Schaffer ◽  
A. A. Viggiano
Keyword(s):  
High Temperature ◽  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate

scholarly journals Selective bond cleavage in RAFT agents promoted by low‐energy electron attachment

2021 ◽  
Author(s):  
Farhad Izadi ◽  
Eugene Arthur-Baidoo ◽  
Lisa T. Strover ◽  
Li-Juan Yu ◽  
Michelle L. Coote ◽  
...  
Keyword(s):  
Bond Cleavage ◽  
Electron Attachment ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron
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