Effect of Direct Current on Precipitation in Quenched Al + 4% Cu Thin Films

1972 ◽  
Vol 20 (6) ◽  
pp. 217-219 ◽  
Author(s):  
M. C. Shine ◽  
S. R. Herd
Keyword(s):  
Thin Films ◽  
Direct Current

Effects of Continuous and Discontinuous Deposition Time in Reactive Direct Current Magnetron Sputtering of Titanium Dioxide Thin Films

2015 ◽  
Vol 1131 ◽  
pp. 251-254
Author(s):  
Montri Aiempanakit ◽  
Chantana Salawan ◽  
Kamon Aiempanakit
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Deposition Time ◽  
Spherical Shape ◽  
Contact Angles ◽  
Water Contact ◽  
Direct Current Magnetron Sputtering

The effect of continuous and discontinuous deposition time on the properties of TiO2 thin films deposited by reactive direct current magnetron sputtering (DCMS) on glass substrates was investigated. The deposition processes were designed for a condition of continuous deposition time D1 (60 min) and three conditions of discontinuous deposition time D2 (30 min × 2 times), D3 (15 min × 4 times), and D4 (1 min × 60 times). The crystal structure, surface morphology, and hydrophilicity of TiO2 thin films were characterized by X-ray diffraction, atomic force microscope, and water contact angle method, respectively. It was found that the increasing of discontinuous deposition time (conditions from D1 to D4) shows the changing of grain size from big grain size with spherical shape to small grain size with oval shape. The crystallinity of TiO2 films decrease with increasing the discontinuous deposition time. The water contact angles also decrease as a function of increasing discontinuous deposition time. These results may be explained from the accumulation of heat on the substrate which affected the phase composition and surface morphology of TiO2 thin films.

Interplay between variable direct current sputtering deposition process parameters and properties of ZnO:Ga thin films

2018 ◽  
Vol 660 ◽  
pp. 538-545 ◽  
Author(s):  
Mohammad Tanvirul Ferdaous ◽  
Seyed Ahmad Shahahmadi ◽  
Megat Mohd Izhar Sapeli ◽  
Puvaneswaran Chelvanathan ◽  
Md. Akhtaruzzaman ◽  
...  
Keyword(s):  
Thin Films ◽  
Process Parameters ◽  
Direct Current ◽  
Deposition Process ◽  
Sputtering Deposition ◽  
Direct Current Sputtering

The impact of argon admixture on the c-axis oriented growth of direct current magnetron sputtered ScxAl1−xN thin films

2014 ◽  
Vol 115 (19) ◽  
pp. 193505 ◽  
Author(s):  
P. M. Mayrhofer ◽  
C. Eisenmenger-Sittner ◽  
M. Stöger-Pollach ◽  
H. Euchner ◽  
A. Bittner ◽  
...  
Keyword(s):  
Thin Films ◽  
Direct Current ◽  
Oriented Growth ◽  
The Impact

Proposed mechanism for the improvements of PZT thin films deposited by direct-current glow discharge assisted laser ablation

1997 ◽  
Vol 195 (1) ◽  
pp. 203-206
Author(s):  
Lirong Zheng ◽  
Chenglu Lin ◽  
W-Ping Xu ◽  
Shigeng Song ◽  
Shichang Zou ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Glow Discharge ◽  
Direct Current ◽  
Pzt Thin Films
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