Reinvestigation of CS2 dissociation at 193 nm by means of product state-selective vacuum ultraviolet laser ionization and velocity imaging

2004 ◽  
Vol 120 (7) ◽  
pp. 3051-3054 ◽  
Author(s):  
Dadong Xu ◽  
Jianhua Huang ◽  
William M. Jackson
Keyword(s):  
Vacuum Ultraviolet ◽  
Laser Ionization ◽  
Product State ◽  
Ultraviolet Laser ◽  
Velocity Imaging ◽  
Vacuum Ultraviolet Laser ◽  
193 Nm

Vacuum Ultraviolet Laser Ablation of Teflon (PTFE)

1992 ◽  
Vol 285 ◽  
Author(s):  
Peter R. Herman ◽  
Boyi Chen ◽  
David J. Moore
Keyword(s):  
Experimental Data ◽  
Laser Ablation ◽  
Computer Model ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Swelling Characteristics ◽  
Vacuum Ultraviolet Laser ◽  
193 Nm ◽  
Fluence Range

ABSTRACTVacuum-ultraviolet laser ablation of Teflon is reviewed. The 157 nm irradiation of Teflon produces clean ablation sites well suited to micromachining applications in the electronics and medical fields. At 193 nm, etching profiles are poorly defined, showing swelling characteristics commonly produced by longer wavelength lasers. Comprehensive new 193 nm ablation data are presented showing the first evidence of incubation effects for Teflon. A computer model was developed to include ablation, swelling and incubation processes. The computer results satisfactorily model the experimental data over a large fluence range of 0.6 to 13 J/cm2 with three adjustable parameters.

Velocity Imaging Studies Using a Vacuum Ultraviolet Laser

2000 ◽  
pp. 103-125 ◽  
Author(s):  
William M. Jackson ◽  
Dadong Xu ◽  
Roosevelt J. Price ◽  
Kevin L. McNesby ◽  
Ian A. McLaren
Keyword(s):  
Vacuum Ultraviolet ◽  
Imaging Studies ◽  
Ultraviolet Laser ◽  
Velocity Imaging ◽  
Vacuum Ultraviolet Laser

Subpicosecond vacuum ultraviolet laser system for advanced materials processing

2007 ◽  
Author(s):  
Shoichi Kubodera ◽  
Yuta Taniguchi ◽  
Akira Hosotani ◽  
Masahito Katto ◽  
Atsushi Yokotani ◽  
...  
Keyword(s):  
Vacuum Ultraviolet ◽  
Laser System ◽  
Advanced Materials ◽  
Materials Processing ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser

Micro-pulling down method-grown Er3+:LiCaAlF6 as prospective vacuum ultraviolet laser material

2013 ◽  
Vol 362 ◽  
pp. 167-169 ◽  
Author(s):  
Marilou Cadatal-Raduban ◽  
Toshihiko Shimizu ◽  
Kohei Yamanoi ◽  
Kohei Takeda ◽  
Minh Hong Pham ◽  
...  
Keyword(s):  
Vacuum Ultraviolet ◽  
Laser Material ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser
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