Size-dependent charge storage in amorphous silicon quantum dots embedded in silicon nitride

2003 ◽  
Vol 83 (5) ◽  
pp. 1014-1016 ◽  
Author(s):  
Nae-Man Park ◽  
Sang-Hun Jeon ◽  
Hyun-Deok Yang ◽  
Hyunsang Hwang ◽  
Seong-Ju Park ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Charge Storage ◽  
Silicon Quantum Dots ◽  
Size Dependent

Preparation and Spectrial Studies of Silicon Nitride Thin Films Containing Amorphous Silicon Quantum Dots

2021 ◽  
Vol 323 ◽  
pp. 48-55
Author(s):  
Jia Xin Sun ◽  
Bing Qing Zhou ◽  
Xin Gu
Keyword(s):  
Thin Films ◽  
Quantum Dots ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Raman Spectra ◽  
Annealing Temperature ◽  
Chemical Vapor ◽  
Blue Shift ◽  
Silicon Quantum Dots ◽  
Plasma Chemical Vapor Deposition

Silicon-rich silicon nitride thin films are prepared on P-type monocrystalline silicon wafer (100) and glass substrate by plasma chemical vapor deposition with reaction gas sources SiH4 and NH3. The deposited samples are thermally annealed from 600°C to 1000°C in an atmosphere furnace filled with high purity nitrogen. The annealing time is 60 minutes. Fourier transform infrared spectroscopy (FTIR) is carried out to investigate the bonding configurations in the films. The results show that the Si-H bond and N-H bond decrease with the increase of annealing temperature, and completely disappear at the annealing temperature of 900°C. But the Si-N bond is enhanced with the increase of annealing temperature, and the blue shift occurs, then Si content in the film increases. The Raman Spectra show that the amorphous Si Raman peak appears at 480 cm-1 in the film at 700°C. The Raman spectra of the films annealed at 1000 °C is fitted with two peaks, and a peak at 497 cm -1 is found, which indicated that the Si phase in the films changed from amorphous to crystalline with the increase of annealing temperature. The experiment also analyses the luminescence properties of the samples through PL spectrum, and it is found that there are five luminescence peaks in each sample under different annealing temperature. Based on the analysis of Raman spectrum and FTIR spectrum, the PL peak of amorphous silicon quantum dots appears at the wavelength range of 525-555nm, and the other four PL peaks are all from the defect state luminescence in the thin films, and the amorphous silicon quantum dot size is calculated according to the formula.

Quantum Confinement in Amorphous Silicon Quantum Dots Embedded in Silicon Nitride

2001 ◽  
Vol 86 (7) ◽  
pp. 1355-1357 ◽  
Author(s):  
Nae-Man Park ◽  
Chel-Jong Choi ◽  
Tae-Yeon Seong ◽  
Seong-Ju Park
Keyword(s):  
Quantum Dots ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Quantum Confinement ◽  
Silicon Quantum Dots

Charging Effect in Amorphous Silicon Quantum Dots Embedded in Silicon Nitride

2000 ◽  
Vol 638 ◽  
Author(s):  
Nae-Man Park ◽  
Sang-Hun Jeon ◽  
Hyunsang Hwang ◽  
Suk-Ho Choi ◽  
Seong-Ju Park
Keyword(s):  
Quantum Dots ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Forward Bias ◽  
Chemical Vapor ◽  
Silicon Quantum Dots ◽  
Band Shift ◽  
Capacitance Voltage ◽  
Dot Density ◽  
Charging Effect

AbstractCapacitance-voltage was investigated for amorphous silicon quantum dots (a-Si QDs) embedded in a silicon nitride as a function of dot size and nitride thickness. a-Sci QDs were grown by plasma enhanced chemical vapor deposition. The electron charging was decreased as the dot size was decreased. These results showed that the conduction band shift is larger than the valence band shift as the dot size decreased and, as a result, electrons are easily discharged in a-Si QDs due to the lower barrier height. For high dot-density-sample, the capacitance-voltage curves were also shifted toward the negative voltage direction when a higher forward bias was applied at forward condition due to the transfer of electrons trapped in the a-Sci QDs from the a-Sci QDs near Si substrate to those near the top metal.

Effect of hydrogen passivation on charge storage in silicon quantum dots embedded in silicon nitride film

2005 ◽  
Vol 86 (14) ◽  
pp. 143107 ◽  
Author(s):  
Chang-Hee Cho ◽  
Baek-Hyun Kim ◽  
Tae-Wook Kim ◽  
Seong-Ju Park ◽  
Nae-Man Park ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Silicon Nitride ◽  
Nitride Film ◽  
Charge Storage ◽  
Silicon Nitride Film ◽  
Hydrogen Passivation ◽  
Silicon Quantum Dots

Characteristics and Charge Storage of Silicon Quantum Dots Embedded in Silicon Nitride Film

2015 ◽  
Vol 44 (3) ◽  
pp. 1015-1020 ◽  
Author(s):  
Wugang Liao ◽  
Xiangbin Zeng ◽  
Xixing Wen ◽  
Wenjun Zheng ◽  
Yangyang Wen ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Silicon Nitride ◽  
Nitride Film ◽  
Charge Storage ◽  
Silicon Nitride Film ◽  
Silicon Quantum Dots

Electron charging and discharging in amorphous silicon quantum dots embedded in silicon nitride

2002 ◽  
Vol 81 (6) ◽  
pp. 1092-1094 ◽  
Author(s):  
Nae-Man Park ◽  
Suk-Ho Choi ◽  
Seong-Ju Park
Keyword(s):  
Quantum Dots ◽  
Silicon Nitride ◽  
Amorphous Silicon ◽  
Silicon Quantum Dots

Size-Dependent Photothermal Performance of Silicon Quantum Dots

2021 ◽  
Vol 125 (6) ◽  
pp. 3421-3431
Author(s):  
İrem Nur Gamze Özbilgin ◽  
Batu Ghosh ◽  
Hiroyuki Yamada ◽  
Naoto Shirahata
Keyword(s):  
Quantum Dots ◽  
Silicon Quantum Dots ◽  
Size Dependent
Sign in / Sign up

Export Citation Format

Share Document