Diagnostics and Simulation of Low-Frequency Inductively Coupled Plasmas

2003 ◽  
Author(s):  
K. N. Ostrikov
Keyword(s):  
Low Frequency ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

In situ catalyzation of carbon nanostructures growth in low-frequency inductively coupled plasmas

2005 ◽  
Vol 33 (2) ◽  
pp. 240-241 ◽  
Author(s):  
J.D. Long ◽  
S. Xu ◽  
S.Y. Huang ◽  
P.P. Rutkevych ◽  
M. Xu ◽  
...  
Keyword(s):  
Carbon Nanostructures ◽  
Low Frequency ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

scholarly journals Effect of an internal rotating current on low-frequency inductively coupled plasmas

2001 ◽  
Vol 63 (4) ◽  
Author(s):  
E. L. Tsakadze ◽  
K. N. Ostrikov ◽  
Xu ◽  
I. R. Jones ◽  
R. Storer ◽  
...  
Keyword(s):  
Low Frequency ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

CONTROL AND DIAGNOSTICS OF INDUCTIVELY COUPLED PLASMAS FOR CHEMICAL VAPOUR DEPOSITION ON NANOCOMPOSITE CARBON NITRIDE-BASED FILMS

2002 ◽  
Vol 16 (06n07) ◽  
pp. 1143-1147 ◽  
Author(s):  
E. TSAKADZE ◽  
K. OSTRIKOV ◽  
Z. TSAKADZE ◽  
N. JIANG ◽  
R. AHMAD ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Chemical Vapour ◽  
Low Frequency ◽  
Chemical Vapor ◽  
Diagnostic Tools ◽  
Inductively Coupled Plasmas ◽  
Rf Power ◽  
Effective Electron ◽  
Inductively Coupled ◽  
Coupled Plasmas

Control and diagnostics of low-frequency (~ 500 kHz) inductively coupled plasmas for chemical vapor deposition (CVD) of nano-composite carbon nitride-based films is reported. Relation between the discharge control parameters, plasma electron energy distribution/probability functions (EEDF/EEPF), and elemental composition in the deposited C-N based thin films is investigated. Langmuir probe technique is employed to monitor the plasma density and potential, effective electron temperature, and EEDFs/EEPFs in Ar + N2 + CH4 discharges. It is revealed that varying RF power and gas composition/pressure one can engineer the EEDFs/EEPFs to enhance the desired plasma-chemical gas-phase reactions thus controlling the film chemical structure. Auxiliary diagnostic tools for study of the RF power deposition, plasma composition, stability, and optical emission are discussed as well.

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