Dynamics of OH formation in photodissociation of pyruvic acid at 193 nm

2003 ◽  
Vol 118 (22) ◽  
pp. 10093-10100 ◽  
Author(s):  
Suresh Dhanya ◽  
Dilip K. Maity ◽  
Hari P. Upadhyaya ◽  
Awadhesh Kumar ◽  
Prakash D. Naik ◽  
...  
Keyword(s):  
Pyruvic Acid ◽  
193 Nm

Time-resolved FTIR studies of the photodissociation of pyruvic acid at 193 nm

1992 ◽  
Vol 193 (1-3) ◽  
pp. 77-83 ◽  
Author(s):  
Gregory E. Hall ◽  
James T. Muckerman ◽  
Jack M. Preses ◽  
Ralph E. Weston ◽  
George W. Flynn
Keyword(s):  
Pyruvic Acid ◽  
Time Resolved ◽  
Ftir Studies ◽  
193 Nm

scholarly journals Looking at the bigger picture: Identifying the photoproducts of pyruvic acid at 193 nm

2020 ◽  
Vol 153 (7) ◽  
pp. 074307
Author(s):  
B. R. Samanta ◽  
R. Fernando ◽  
D. Rösch ◽  
H. Reisler ◽  
D. L. Osborn
Keyword(s):  
Pyruvic Acid ◽  
193 Nm

Mg++ - and Ca++-Induced Platelet Aggregation and ADP

1970 ◽  
Vol 24 (03/04) ◽  
pp. 432-437 ◽  
Author(s):  
S Cronberg ◽  
J. P Caen
Keyword(s):  
Platelet Aggregation ◽  
Pyruvate Kinase ◽  
Pyruvic Acid ◽  
Active Principle ◽  
Platelet Suspension ◽  
Edta Plasma ◽  
Phosphoenol Pyruvic Acid

SummaryReports on platelet aggregation after addition of calcium or magnesium to EDTA- PRP or platelet suspensions were confirmed. An aggregating principle was found in the EDTA-plasma and the supernatant of the platelet suspensions. Aggregation by magnesium in a platelet suspension was inhibited by adenosine and phosphoenol- pyruvic acid and pyruvate kinase, which suggested that the active principle was identical with ADP. Degradation of ADP in EDTA plasma was blocked.It thus appears that aggregation induced by calcium or magnesium in EDTA-PRP and platelet suspension was due to accumulation of spontaneously liberated ADP, which was not degraded.

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

1994 ◽  
Vol 30 (14) ◽  
pp. 1133-1134 ◽  
Author(s):  
P. E. Dyer ◽  
K. C. Byron ◽  
R. J. Farley ◽  
R. Giedl
Keyword(s):  
Bragg Grating ◽  
Fibre Bragg Grating ◽  
Arf Laser ◽  
193 Nm

Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

2003 ◽  
Vol 150 (1) ◽  
pp. G58 ◽  
Author(s):  
Sang-Yun Lee ◽  
Yong-Bae Kim ◽  
Jeong Soo Byun
Keyword(s):  
Antireflection Coating ◽  
Dual Damascene ◽  
Damascene Process ◽  
193 Nm
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