Nd0.8Y0.2NiO3 thin films with room-temperature metal–insulator transition deposited by pulsed laser ablation
2018 ◽
Vol 115
(38)
◽
pp. 9515-9520
◽
Keyword(s):
2004 ◽
Vol 40
(1)
◽
pp. 11-17
◽
1990 ◽
Vol 48
(4)
◽
pp. 706-707
Keyword(s):
Keyword(s):