Reduced pressure chemical vapor deposition of Si/Si1−yCy heterostructures forn-type metal–oxide–semiconductor transistors

J. M. Hartmann; T. Ernst; V. Loup; F. Ducroquet; G. Rolland; D. Lafond; P. Holliger; F. Laugier; M. N. Séméria; S. Deleonibus

doi:10.1063/1.1497451

Reduced pressure chemical vapor deposition of Si/Si1−yCy heterostructures forn-type metal–oxide–semiconductor transistors

Journal of Applied Physics ◽

10.1063/1.1497451 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2368-2373 ◽

Cited By ~ 17

Author(s):

J. M. Hartmann ◽

T. Ernst ◽

V. Loup ◽

F. Ducroquet ◽

G. Rolland ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Reduced Pressure ◽

Pressure Chemical

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Reduced pressure–chemical vapor deposition of high Ge content Si1−xGex and high C content Si1−yCy layers for advanced metal oxide semiconductor transistors

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2005.01.076 ◽

2005 ◽

Vol 277 (1-4) ◽

pp. 114-123 ◽

Cited By ~ 21

Author(s):

J.M. Hartmann ◽

Y. Bogumilowicz ◽

F. Andrieu ◽

P. Holliger ◽

G. Rolland ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Reduced Pressure ◽

Pressure Chemical

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Fabrication of a Si1-xGexChannel Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) Containing High Ge Fraction Layer by Low-Pressure Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.438 ◽

1993 ◽

Vol 32 (Part 1, No. 1B) ◽

pp. 438-441 ◽

Cited By ~ 35

Author(s):

Kinya Goto ◽

Junichi Murota ◽

Takahiro Maeda ◽

Reiner SchÜtz ◽

Kiyohito Aizawa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Pressure Chemical ◽

Effect Transistor

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Improved C–V characteristics of metal-oxide-semiconductor capacitors with tantalum nitride gate electrodes grown by ultra-low-pressure chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1835311 ◽

2005 ◽

Vol 23 (1) ◽

pp. 42 ◽

Cited By ~ 14

Author(s):

Masaru Kadoshima ◽

Koji Akiyama ◽

Katsuhiko Yamamoto ◽

Hideaki Fujiwara ◽

Tetsuji Yasuda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metal Oxide Semiconductor ◽

Tantalum Nitride ◽

Oxide Semiconductor ◽

Gate Electrodes ◽

Pressure Chemical

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P-Channel Metal Oxide Semiconductor Field Effect Transistors with Polycrystalline-Si1-xGex Gate Grown by Ultra-High Vacuum Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.l1099 ◽

1999 ◽

Vol 38 (Part 2, No. 10A) ◽

pp. L1099-L1101 ◽

Cited By ~ 4

Author(s):

Kun-Ming Chen ◽

Hsiang-Jen Huang ◽

Guo-Wei Huang ◽

Chun-Yen Chang ◽

Liang-Po Chen

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistors ◽

High Vacuum ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Ultra High Vacuum ◽

Oxide Semiconductor

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A New Tungsten Gate Metal Oxide Semiconductor Capacitor Using a Chemical Vapor Deposition Process

Journal of The Electrochemical Society ◽

10.1149/1.1837387 ◽

1997 ◽

Vol 144 (1) ◽

pp. 214-217 ◽

Cited By ~ 8

Author(s):

Wen‐Kuan Yeh ◽

Yeu‐Cherng Shiau ◽

Mao‐Chieh Chen

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Chemical Vapor Deposition Process ◽

Metal Oxide Semiconductor Capacitor ◽

Vapor Deposition Process

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ChemInform Abstract: Preparation of Device-Quality SiO2 Thin Films by Remote Plasma- Enhanced Chemical Vapor Deposition (PECVD): Applications in Metal- Oxide-Semiconductor (MOS) Devices

ChemInform ◽

10.1002/chin.199636322 ◽

2010 ◽

Vol 27 (36) ◽

pp. no-no

Author(s):

G. LUCOVSKY

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Remote Plasma ◽

Mos Devices

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Thin oxynitride film metal‐oxide‐semiconductor transistors prepared by low‐pressure rapid thermal chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.110067 ◽

1993 ◽

Vol 63 (26) ◽

pp. 3619-3621 ◽

Cited By ~ 11

Author(s):

P. K. McLarty ◽

W. L. Hill ◽

X.‐L. Xu ◽

V. Misra ◽

J. J. Wortman ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Thermal Chemical Vapor Deposition ◽

Oxynitride Film

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Ge diffusion in Ge metal oxide semiconductor with chemical vapor deposition HfO2 dielectric

Applied Physics Letters ◽

10.1063/1.2001757 ◽

2005 ◽

Vol 87 (5) ◽

pp. 051922 ◽

Cited By ~ 105

Author(s):

N. Lu ◽

W. Bai ◽

A. Ramirez ◽

C. Mouli ◽

A. Ritenour ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor

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Compositional and electrical properties of InSb metal oxide semiconductor structure fabricated by photo-chemical vapor deposition

Vacuum ◽

10.1016/0042-207x(91)91335-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1060-1061

Author(s):

CJ Huang ◽

YK Su ◽

RL Leu

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Semiconductor Structure ◽

Oxide Semiconductor ◽

Metal Oxide Semiconductor Structure

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$\bf SiO_{2}/InP$ Structure Prepared by Direct Photo-Chemical Vapor Deposition Using Deuterium Lamp and Its Applications to Metal-Oxide-Semiconductor Field-Effect Transistor

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.476 ◽

1995 ◽

Vol 34 (Part 1, No. 2A) ◽

pp. 476-481 ◽

Cited By ~ 2

Author(s):

Shih-Chang Shei ◽

Yan-Kuin Su ◽

Chih-Jen Hwang ◽

Meiso Yokoyama

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Field Effect ◽

Field Effect Transistor ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Effect Transistor ◽

Deuterium Lamp

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