Mechanisms of oxygen incorporation in indium–tin–oxide films deposited by laser ablation at room temperature

2002 ◽  
Vol 80 (20) ◽  
pp. 3757-3759 ◽  
Author(s):  
M. A. Morales-Paliza ◽  
R. F. Haglund ◽  
L. C. Feldman
Keyword(s):  
Laser Ablation ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Oxygen Incorporation ◽  
Tin Oxide Films

Resistivity and oxygen content of indium tin oxide films deposited at room temperature by pulsed-laser ablation

1999 ◽  
Vol 86 (2) ◽  
pp. 991-994 ◽  
Author(s):  
Y. Wu ◽  
C. H. M. Marée ◽  
R. F. Haglund ◽  
J. D. Hamilton ◽  
M. A. Morales Paliza ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Oxygen Content ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Tin Oxide Films

Pulsed Laser Deposition of Crystalline Indium Tin Oxide Films at Room Temperature by Substrate Laser Irradiation

2000 ◽  
Vol 39 (Part 2, No. 4B) ◽  
pp. L377-L379 ◽  
Author(s):  
Frederick O. Adurodija ◽  
Hirokazu Izumi ◽  
Tsuguo Ishihara ◽  
Hideki Yoshioka ◽  
Muneyuki Motoyama ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Laser Irradiation ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tin Oxide Films

Amorphous indium tin oxide films deposited on flexible substrates by facing target sputtering at room temperature

2014 ◽  
Vol 556 ◽  
pp. 155-159 ◽  
Author(s):  
Yu Xiao ◽  
Fangyuan Gao ◽  
Guobo Dong ◽  
Tingting Guo ◽  
Qirong Liu ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Flexible Substrates ◽  
Facing Target Sputtering ◽  
Tin Oxide Films
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